Hydrochloric Acid → Bis(3-(trifluoromethoxy)phenyl)methanone

HRID 511934

反応式

HRID 511934 の反応式
Br[C:2]1[CH:7]=[CH:6][CH:5]=[C:4]([O:8][C:9]([F:12])([F:11])[F:10])[CH:3]=1.[Li]CCCC.CCCCCC.[F:24][C:25]([F:36])([F:35])[O:26][C:27]1[CH:28]=[C:29]([CH:32]=[CH:33][CH:34]=1)[C:30]#N.Cl.C([O:40]CC)C>O>[F:10][C:9]([F:12])([F:11])[O:8][C:4]1[CH:3]=[C:2]([C:30]([C:29]2[CH:32]=[CH:33][CH:34]=[C:27]([O:26][C:25]([F:36])([F:35])[F:24])[CH:28]=2)=[O:40])[CH:7]=[CH:6][CH:5]=1

参加物

8

反応条件

温度
-78 °C

実験手順

To a solution of 1-bromo-3-(trifluoromethoxy)benzene (1.52 g, 6.3 mmol) in diethyl ether (50 mL) at −78° C. was added dropwise a solution of 1.6 M n-BuLi in hexane (4.2 mL, 6.6 mmol) and the reaction mixture was stirred at −78° C. for 30 min. A solution of 3-(trifluoromethoxy)benzonitrile (1.23 g, 6.6 mmol) in diethyl ether (5 mL) was added dropwise and the reaction mixture was stirred at −78° C. for 1.5 h. 3N HCl (40 mL) was added and the reaction was allowed to warm to rt followed by stirring at rt for 1.5 h. The reaction mixture was diluted with H2O (40 mL) and extracted with EtOAc (3×75 mL). The combined organic extracts were dried over Na2SO4, filtered and concentrated under reduced pressure to yield a residue. The residue was purified by a silica gel ISCO cartridge with elution at gradient 10% EtOAc/hexane to give bis(3-(trifluoromethoxy)phenyl)methanone (1.99 g, 90% yield) as a white solid. LCMS: RT=2.10 min [M+H] 351.3 (2 min Phenomenex Luna C18 column, 4.6×30 mm eluting with 10-90% MeOH/H2O over 2 minutes containing 0.1% TFA; 5 mL/min, monitoring at 220 nm); NMR: 400 MHz 1H(CDCl3) ppm 7.46 (d, J=8.35 Hz 1 H), 7.54 (t, J=7.91 Hz, 1 H), 7.64 (s, 1 H), 7.70 (d, J=7.91 Hz, 1 H).

後処理

  1. stirringthe reaction mixture was stirred at −78° C. for 1.5 h
  2. temperatureto warm to rt
  3. stirringby stirring at rt for 1.5 h
  4. extractionextracted with EtOAc (3×75 mL)
  5. dry with materialThe combined organic extracts were dried over Na2SO4
  6. filtrationfiltered
  7. concentrationconcentrated under reduced pressure
  8. customto yield a residue
  9. customThe residue was purified by a silica gel ISCO cartridge with elution at gradient 10% EtOAc/hexane

出典と根拠

ORDレコード
ord-f34357fcfdbe4c20b2f8ef902ec10f6a
出典データセット
uspto-grants-2015_08
特許番号
US09102599B2

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