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Trifluoromethane → Diethyl bis(trifluoromethyl)silane
関与物質
| 役割 | 名称 | HCID | 仕込み量 |
|---|---|---|---|
| 反応物 | Trifluoromethane | HCID 6373 | — |
| 反応物 | Diethyldichlorosilane | HCID 15589 | — |
| 反応物 | Potassium bis(trimethylsilyl)amide | HCID 3251421 | — |
| 生成物 | Diethyl bis(trifluoromethyl)silane | HCID 89157714 | 44% |
反応手順
A similar procedure to the one reported in EXAMPLE 2 was followed except dichlorodiethylsilane (5.12 g, 32.5 mmol, 1 eq) was used as the substrate along with 2eq each of CF3H and KHMDS to obtain pure diethyl bis(trifluoromethyl)silane 3.2 g, 44% yield. 1H NMR (400 MHz): δ 1.08 (m, CH2), 1.16 (m, CH3); 13C NMR (100.5 MHz): δ-1.10 (s, CH2), 5.55 (s, CH3), 128.6 (qq, 1JC—F=319 Hz, 3.35 Hz, CF3); 19F NMR (376.3 MHz): δ-60.2 (s); 29Si NMR (79.5 MHz): δ-2.43 (sept, 2JSi—F=39.4 Hz, 1 Si).
情報源と証拠
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| 特許番号 | US09334253B2 |
| 出典データセット | uspto-grants-2016_05 |
| ORD ID | ord-91a391a409d645d0944cba77728e9673 |
| 出典メモ | uspto-grants-2016_05 |