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4-Methylmorpholine → HCID 86684768、化合物

HRID 579159
ノート
印刷プレビュー

反応式

HRID 579159 の反応式
[CH2:1]([O:8][C:9]([NH:11][C@H:12]([CH:16]1[CH2:21][CH2:20][CH2:19][CH2:18][CH2:17]1)[C:13]([OH:15])=O)=[O:10])[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.CN([C:25]([O:29][N:30]1N=NC2C=CC=N[C:31]1=2)=[N+](C)C)C.F[P-](F)(F)(F)(F)F.Cl.CNOC.CN1CCOCC1>CN(C=O)C.CCOC(C)=O>[CH2:1]([O:8][C:9](=[O:10])[NH:11][C@H:12]([CH:16]1[CH2:21][CH2:20][CH2:19][CH2:18][CH2:17]1)[C:13](=[O:15])[N:30]([O:29][CH3:25])[CH3:31])[C:2]1[CH:3]=[CH:4][CH:5]=[CH:6][CH:7]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

7

反応物 4

HCID 79724-MethylmorpholineHCID 81138Methanamine, N-methoxy-, hydrochloride (1:1)HCID 9886157Methanaminium, N-((dimethylamino)(3H-1,2,3-triazolo(4,5-b)pyridin-3-yloxy)methylene)-N-methyl-, hexafluorophosphate(1-) (1:1)HCID 14510026(2R)-{[(Benzyloxy)carbonyl]amino}(cyclohexyl)acetic acid

生成物 1

HCID 86684768HCID 86684768、化合物収率 90%

試薬・触媒・溶媒 2

HCID 6228Dimethylformamide溶媒HCID 8857Ethyl Acetate溶媒

反応条件

温度
0 °C

実験手順

To a solution of (R)-benzyloxycarbonylamino-cyclohexyl-acetic acid (25 g, 88 mmol) in DMF (100 mL) at −10° C. was added HATU (36.7 g, 96 mmol, 1.0 equiv) followed by N,O-dimethyl hydroxyamine HCl salt (10.3 g, 105 mmol, 1.2 equiv). To this solution was then slowly added N-methyl morpholine (28.9 mL, 263 mmol, 3.0 equiv). The internal temperature was carefully monitored. During the addition, the internal temperature rose to 0° C. The solution was stirred at 0° C. for 2 hours after which the solution was diluted with EtOAc (500 mL) and washed with sat. aq. NaHCO3 solution, water, 1.0 N aq. HCl solution and brine. The organic layer was dried over Na2SO4 and the solvent including DMF was removed under vacuum. The residue was diluted with EtOAc and the solution was washed with water, brine, dried (MgSO4) and concentrated to give product [(R)-Cyclohexyl-(methoxy-methyl-carbamoyl)-methyl]-carbamic acid benzyl ester 26 g (yield 90%).

後処理

  1. additionDuring the addition
  2. customrose to 0° C
  3. washwashed with sat. aq. NaHCO3 solution, water, 1.0 N aq. HCl solution and brine
  4. dry with materialThe organic layer was dried over Na2SO4
  5. customwas removed under vacuum
  6. additionThe residue was diluted with EtOAc
  7. washthe solution was washed with water, brine
  8. dry with materialdried (MgSO4)
  9. concentrationconcentrated

出典と根拠

ORDレコード
ord-25901e1eecd14506ba7cc989d7f28595
出典データセット
uspto-grants-2015_05
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US09040690B2

反応ノート

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このページの内容参加物反応条件実験手順後処理出典と根拠反応ノート