関与物質
| 役割 | 名称 | HCID | 仕込み量 |
|---|
| 反応物 | Acetylene | HCID 6326 | — |
| 反応物 | Silane | HCID 23953 | — |
| 反応物 | N,N,N',N',N'',N''-Hexamethylsilanetriamine | HCID 84795 | — |
| 触媒 | Chloroplatinic acid | HCID 61859 | — |
| 生成物 | 1-Ethyl-N,N,N',N',N'',N''-hexamethylsilanetriamine | HCID 207257 | — |
反応手順
A two liter stirred batch reactor was purged with nitrogen gas and thereafter charged with 840 g (5.22 moles) of tris(dimethylamino)silane and 5 ppm hexachloroplatinic acid. The reactor was then pressurized to approximately 5 psig with nitrogen gas and heated to approximately 250° C. The acetylene inlet feed was started and maintained at 100 psig. The reaction temperature was maintained at 250° C. After four hours the acetylene flow was stopped, the reaction mix cooled and the reaction products analyzed. Vinyltris(dimethyl)amino)silane was the single major product at 90% of theoretical. Ethyltris(dimethylamino)silane and 1,2-bis(trisdimethylamino)silylethane by-products were formed in amounts less than 0.5% each. Vinyltris(dimethylamino)silane polymer was also formed in an amount of 7-8%.
情報源と証拠
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| 特許番号 | US04558146 |
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| 出典データセット | uspto-grants-1985_12 |
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| ORD ID | ord-f19a773dbde64e59b5890b82eeed2fcc |
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| 出典メモ | uspto-grants-1985_12 |
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