関与物質
| 役割 | 名称 | HCID | 仕込み量 |
|---|
| 反応物 | Allyl chloride | HCID 7850 | — |
| 反応物 | Triethylsilane | HCID 12052 | — |
| 生成物 | Chlorotriethylsilane | HCID 13819 | 42% |
| 生成物 | (3-Chloropropyl)(triethyl)silane | HCID 12566784 | 15.5% |
反応手順
In a 100 ml apparatus, there were combined 11.6 g (0.1 mol) of Et3SiH, 7.7 g (0.1 mol of allyl chloride, and 0.05 ml Pt catalyst solution at 19° C. After stirring 1 hr, temperature had increased to 27° C., followed by heating at 70° C. for 17 hr. The incomplete reaction was vacuum distilled, yielding 8.9 g (42%) of Et3SiCl, and 3.0 g (15.5%) of Et3SiCH2CH2CH2Cl. The Et3SiCH2CH2C2Cl/Et3SiCl molar selectivity ratio was 0.37. This example shows that the unpromoted reaction between Et3SiH and CH2 =CHCH2Cl is very slow.
情報源と証拠
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| 特許番号 | US04614812 |
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| 出典データセット | uspto-grants-1986_09 |
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| ORD ID | ord-e30a5601495043339abb7adf624c51b0 |
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| 出典メモ | uspto-grants-1986_09 |
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