関与物質
| 役割 | 名称 | HCID | 仕込み量 |
|---|
| 反応物 | 3-Chloro-1-butene | HCID 11242 | — |
| 反応物 | Triethylsilane | HCID 12052 | — |
| 生成物 | Chlorotriethylsilane | HCID 13819 | 58.9% |
| 生成物 | Et3SiCH2CH2CHMeCl | HCID 13765479 | 7.6% |
反応手順
In a 50 ml apparatus, there were combined 4.5 g (0.039 mol) of Et3SiH and 3.5 g (0.039 mol) of 3-chloro-1-butene. Pt catalyst solution (0.01 ml) was added at 22° C., followed by heating up to 77° C. over 70 min. Vacuum distillation yielded 3.46 g (58.9%) of Et3SiCl and 0.61 g (7.6%) of Et3SiCH2CH2CHMeCl. This example demonstrates the low yield of Et3SiCH2CH2CHMeCl from the unpromoted reaction of Et3SiH with 3-chloro-1-butene.
情報源と証拠
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| 特許番号 | US04614812 |
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| 出典データセット | uspto-grants-1986_09 |
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| ORD ID | ord-45673193f8e042e78e06b4e60f4b1eb9 |
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| 出典メモ | uspto-grants-1986_09 |
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