Citric Acid → 6-{2-[2-(4-Chloro-phenyl)-2,4,5,6-tetrahydro-cyclopentapyrazol-3-yl]-2-cyclohexyl-ethoxy}-nicotinic acid methyl ester
反応式
[Cl:1][C:2]1[CH:7]=[CH:6][C:5]([N:8]2[C:12]([CH:13]([CH:23]3[CH2:28][CH2:27][CH2:26][CH2:25][CH2:24]3)[C:14](NC3CCCCC3)=[O:15])=[C:11]3[CH2:29][CH2:30][CH2:31][C:10]3=[N:9]2)=[CH:4][CH:3]=1.[C:32]([O-])([O-])=[O:33].[K+].[K+].ClC1C=CC([N:45]2[C:49]([CH:50]([CH:57]3[CH2:62][CH2:61]CCC3)[CH2:51][O:52]S(C)(=O)=O)=C3CCCC3=N2)=CC=1.C(O)(=O)CC(CC(O)=O)(C(O)=O)O>CN(C=O)C.CCOC(C)=O>[CH3:32][O:33][C:51](=[O:52])[C:50]1[CH:57]=[CH:62][C:61]([O:15][CH2:14][CH:13]([C:12]2[N:8]([C:5]3[CH:6]=[CH:7][C:2]([Cl:1])=[CH:3][CH:4]=3)[N:9]=[C:10]3[CH2:31][CH2:30][CH2:29][C:11]=23)[CH:23]2[CH2:28][CH2:27][CH2:26][CH2:25][CH2:24]2)=[N:45][CH:49]=1参加物
反応物 4
生成物 1
試薬・触媒・溶媒 2
反応条件
- 温度
- 0 °C
実験手順
To a solution of methyl 6-hydroxynicotinate 4 (80 mg, 0.19 mmol; CAS Reg. No. 10128-91-3) in dry DMF (3 ml) was added dry K2CO3 (29 mg, 0.226 mmol) at 0° C. The reaction mixture was stirred for 15 minutes at 0° C. Methanesulfonic acid 2-[2-(4-chloro-phenyl)-2,4,5,6-tetrahydro-cyclopentapyrazol-3-yl]-2-cyclohexyl-ethyl ester (35 mg, 0.227 mmol) dissolved in dry DMF (1 ml) was added at 0° C. The reaction mixture was heated to 100° C. in a sealed tube for 12 h. 10% Aqueous citric acid solution (10 ml) and EtOAc (5 ml) were added to the reaction mixture. The layers were separated and the aqueous layer was extracted one more time with EtOAc (5 ml). The combined organic layers were washed with brine (5 ml) and dried over Na2SO4. The solvent was removed under reduced pressure to give a residue which was purified by column chromatography over silica gel (20% EtOAc/hexane) to give the title compound (60.2 mg, 0.12 mmol; 67%) as off-white solid.
後処理
- additionwas added at 0° C
- temperatureThe reaction mixture was heated to 100° C. in a sealed tube for 12 h
- customThe layers were separated
- extractionthe aqueous layer was extracted one more time with EtOAc (5 ml)
- washThe combined organic layers were washed with brine (5 ml)
- dry with materialdried over Na2SO4
- customThe solvent was removed under reduced pressure
- customto give a residue which
- customwas purified by column chromatography over silica gel (20% EtOAc/hexane)
出典と根拠
- ORDレコード
- ord-c16aff626632482693e797bb76495245
- 出典データセット
- uspto-grants-2012_08
- 特許番号
- US08252826B2
反応ノート
読み込み中…