229325-98-8CC(C)(C)c1ccc([I+]c2ccc(C(C)(C)C)cc2)cc1.O=S(=O)([O-])c1ccccc1C(F)(F)FILYGGWOGJKVSLD-UHFFFAOYSA-M229325-98-8안전 정보는 참고용이며, 공급업체의 물질안전보건자료(SDS), 관련 법규 및 전문가 평가를 대체하지 않습니다.
Danger
H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
P260, P264, P280, P301+P330+P331, P302+P361+P354, P304+P340, P305+P354+P338, P316, P321, P363, P405, and P501 (click each P-code to see the statement)
Aggregated GHS information provided per 55 reports by companies from 1 notifications to the ECHA C&L Inventory.
용도Bis(4-(tert-butyl)phenyl)iodonium 2-(trifluoromethyl)benzenesulfonate is a sulfonate compound that can be used as a photoacid generator (PAG) component in the preparation of EUV patterning photoresists.
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