Triphenylsulfonium chloride
LFC1064 · triphenylsulfonium ion · triphenylsulfurchloride · triphenylchlorothiosalt · Triphenylsulfoniumchlorid · triphenyl-sulfoniuchloride · triphenylsulfanium chloride · TRIPHENYLSULFONIUM CHLORIDE
식별자 및 물리적 특성
| CAS No. | 4270-70-6 |
|---|---|
| 분자식 | C18H15S.Cl |
| 평균 분자량 | 298.8 g/mol |
| 단동위원소 질량 | 298.05829916 g/mol |
| SMILES | [Cl-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1 |
| InChIKey | ZFEAYIKULRXTAR-UHFFFAOYSA-M |
| PubChem CID | 61343 |
| EC No. | 224-259-6 |
| DTXSID | DTXSID5052096 |
화학 및 물리적 성질
| 극성 표면적 | 1 |
|---|---|
| 수소 결합 공여자 수 | 0 |
| 수소 결합 수용자 수 | 1 |
| 회전 가능 결합 수 | 3 |
| 무거운 원자 수 | 20 |
| 형식 전하 | 0 |
| 복잡도 | 202 |
| 녹는점 | 277 °C |
| 저장 조건 | under inert gas (nitrogen or Argon) at 2-8°C |
| 물리적 상태 | 가루 |
| 색상 | 희미한 노란색 |
| 용해도 | 물에 용해됩니다. |
| InChI | InChI=1S/C18H15S.ClH/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18/h1-15H1H/q+1/p-1 |
| InChIKey | ZFEAYIKULRXTAR-UHFFFAOYSA-M |
| SMILES | [S+](C1=CC=CC=C1)(C1=CC=CC=C1)C1C=CC=CC=1.[Cl-] |
| EPA | Triphenylsulfonium chloride (4270-70-6) |
안전 및 규제
| GHS 분류 | WarningH315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501 (click each P-code to see the statement)Aggregated GHS information provided per 46 reports by companies from 6 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies. |
|---|---|
| 규제 정보 | Chemical: Sulfonium, triphenyl-, chlorideSulfonium, triphenyl-, chloride: Does not have an individual approval but may be used as a component in a product covered by a group standard. It is not approved for use as a chemical in its own right. |
| Hazard Classes and Categories | Skin Irrit. 2 (100%) |
| 수질 위해 등급(WGK) | 3 |
| 관세 코드 | 2930909899 |
| 위험 문구(R) | 36/37/38 |
| 위험 표시 | Xi |
| 안전 문구(S) | 26 |
용도
용도
Triphenylsulfonium chloride is used as a key intermediate that is widely used in the new electronic chemicals such as semiconductor, LCD and TFT. It is also used as a photoacid generator (PAG) in Catalyst activation through in situ photogeneration of ligands.
제조 및 합성 방법
제조 방법
Triphenylsulfonium Chloride Synthesis: Diphenyl sulfoxide, 40 g (0.2 mole), was dissolved in 400 g of dichloroethane, which was stirred under ice cooling. At a temperature below 20° C., 65 g (0.6 mole) of trimethylsilyl chloride was added dropwise to the solution, which was aged for 30 minutes at the temperature. Then, a Grignard reagent which had been prepared from 14.6 g (0.6 mole) of metallic magnesium, 67.5 g (0.6 mole) of chlorobenzene and 168 g of tetrahydrofuran (THF) was added dropwise at a temperature below 20° C. The reaction solution was aged for one hour, after which 50 g of water at a temperature below 20° C. was added to quench the reaction. To this solution, 150 g of water, 10 g of 12N hydrochloric acid, and 200 g of diethyl ether were further added.The water layer was separated and washed with 100 g of diethyl ether, yielding an aqueous solution of triphenylsulfonium chloride. The compound in aqueous solution form was used in the subsequent reaction without further isolation.