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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HCID 6791생성일: 2026년 10월 26일

4-하이드록시나프탈렌-1-술포닉산

4-하이드록시나프탈렌-1-술포닉산 · Niven acid · Neville acid · 1,4-Oxy Acid · Nevile-Winther acid · Nevile-Winthers acid · 1-Naphthol-4-sulfoni · HIGH-PURITY N.W. ACID

https://huagongshe.com/ko/chemical/6791

4-하이드록시나프탈렌-1-술포닉산 분자 구조식

식별자 및 물리적 특성

CAS No.84-87-7
분자식C10H8O4S
평균 분자량224.23 g/mol
단동위원소 질량224.01432974 g/mol
SMILESO=S(=O)(O)c1ccc(O)c2ccccc12
InChIKeyHGWQOFDAUWCQDA-UHFFFAOYSA-N
PubChem CID6791
ChEMBLCHEMBL2312197
EC No.201-568-4
DTXSIDDTXSID2058910
현지명4-하이드록시나프탈렌-1-술포닉산

화학 및 물리적 성질

XLogP2.1
극성 표면적83
수소 결합 공여자 수2
수소 결합 수용자 수4
회전 가능 결합 수1
무거운 원자 수15
형식 전하0
복잡도319
녹는점170℃
끓는 점335.63°C (rough estimate)
밀도1.4643 (rough estimate)
굴절률1.7040 (estimate)
저장 조건2-8°C, stored under nitrogen, away from moisture
pKa(산도 계수)0.73±0.40(Predicted)
물리적 상태고체
색상흰색에서 노란색으로
InChIInChI=1S/C10H8O4S/c11-9-5-6-10(15(12,13)14)8-4-2-1-3-7(8)9/h1-6,11H,(H,12,13,14)
InChIKeyHGWQOFDAUWCQDA-UHFFFAOYSA-N
SMILESC1(S(O)(=O)=O)=C2C(C=CC=C2)=C(O)C=C1
EPA1-Naphthalenesulfonic acid, 4-hydroxy- (84-87-7)

안전 및 규제

GHS 분류This chemical does not meet GHS hazard criteria for 1.6% (2 of 124) of reports.WarningH315 (97.6%): Causes skin irritation [Warning Skin corrosion/irritation]P264, P264+P265, P280, P302+P352, P305+P351+P338, P321, P332+P317, P337+P317, and P362+P364 (click each P-code to see the statement)Aggregated GHS information provided per 124 reports by companies from 5 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.
규제 정보Status: Active Update: 14-07-2017 https://echa.europa.eu/registration-dossier/-/registered-dossier/10797
Hazard Classes and CategoriesSkin Irrit. 2 (97.6%)
TSCA 등재 상태TSCA listed

제조 및 합성 방법

제조 방법

After drying under vacuum, the resulting filter cake contains 1-naphthol-4-sulphonic acid in a yield of 92% of theory and <0.5% 1-naphthol-2-sulphonic acid and 3% of 1-naphthol-2,4-disulphonic acid based on the weight of 1-naphthol-4-sulphonic acid.