Diethylsilane

(C2H5)2SiH2 · 3-Silapentane · diethyl-silan · Diethylsilane · diethylsilicon · Silane, diethyl- · Diethylsilane,97% · Diethylsilane,98+%

https://huagongshe.com/ko/chemical/68337

식별자 및 물리적 특성

CAS No.	542-91-6
분자식	C4H12Si
평균 분자량	88.22 g/mol
단동위원소 질량	88.07082691 g/mol
SMILES	CC[SiH2]CC
InChIKey	UCXUKTLCVSGCNR-UHFFFAOYSA-N
PubChem CID	68337
EC No.	208-834-9
DTXSID	DTXSID20870601

화학 및 물리적 성질

극성 표면적	0
수소 결합 공여자 수	0
수소 결합 수용자 수	0
회전 가능 결합 수	2
무거운 원자 수	5
형식 전하	0
복잡도	11.1
물질 분류	Metals -> Metalloid Compounds (Silicon)
SpringerMaterials Properties	Dielectric constant
증기압	207.52 [mmHg]
Physical Description	Liquid[Merck Index] Clear colorless liquid[MSDSonline]
녹는점	-132°C
끓는 점	56 °C (lit.)
밀도	0.681 g/mL at 25 °C (lit.)
굴절률	n20/D 1.391(lit.)
인화점	−20 °F
저장 조건	under inert gas (nitrogen or Argon) at 2-8°C
용해도	테라히드로푸란, 디에틸 에테르, 1,4-디옥산 및 벤젠과 혼합 가능.
물리적 상태	액체
비중	0.683
Merck	14,3128
BRN	1730902
InChI	1S/C4H12Si/c1-3-5-4-2/h3-5H2,1-2H3
InChIKey	UCXUKTLCVSGCNR-UHFFFAOYSA-N
SMILES	CC[SiH2]CC
EPA	Silane, diethyl- (542-91-6)

안전 및 규제

GHS 분류	DangerH225 (100%): Highly Flammable liquid and vapor [Danger Flammable liquids]P210, P233, P240, P241, P242, P243, P261, P264, P264+P265, P270, P271, P280, P301+P317, P302+P352, P303+P361+P353, P304+P340, P305+P351+P338, P319, P321, P330, P332+P317, P337+P317, P362+P364, P370+P378, P403+P233, P403+P235, P405, and P501 (click each P-code to see the statement)Aggregated GHS information provided per 70 reports by companies from 4 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.
유해성 요약	An irritantHighly flammableOrganic silicon compounds are generally of low toxicity. Acute and chronic toxicity not fully known[Alfa Aesar MSDS]
Hazard Classes and Categories	Flam. Liq. 2 (100%)
수질 위해 등급(WGK)	1
TSCA 등재 상태	TSCA listed
운송 번호(UN)	UN 1993 3/PG 2
위험 문구(R)	11
위험 표시	F
안전 문구(S)	16-23-24/25
포장분류	II
위험 등급	3Flam. Liq. 2
기존화학 물질	2015-3-6979
저장 분류	3 - Flammable liquids

용도

Diethylsilane is used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It is also used in the chemical vapor deposition of SiO2 for microelectronics.