Acetic acid, 1,1',1'',1'''-tetraanhydride with silicic acid (H4SiO4)

용도Silicon tetraacetate is used in the preparation of silicon dioxide thin films by a direct photochemical vapor deposition method. It serves as a precursor to prepare silicon complexes with monofunctional bidentate Schiff bases. It is also used as an alternative to silicon hydride and alkoxide for low-temperature silicon dioxide production. Further, it reacts with ethanol in the absence of water to get silica gel and ethyl acetate. In addition, it is employed as a sol-gel precursor.

일반 설명Silicon tetraacetate is an alternative to silicon hydride and alkoxide for low-temperature SiO2 production. Silicon tetraacetate reacts with ethanol in absence of water to form silica gel and ethyl acetate. Silicon tetraacetate is reported as a sol-gel precursor.