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HCID 70327생성일: 2026년 10월 27일

(2-Phenylethyl)trichlorosilane

(2-PHENYLETHYL)TRICHLOROSILANE · DK428 · trichlorophenethylsilane · trichlorophenethyl-silan · Phenethyltrichlorosilane · trichlor-2-fenylethylsilan · B-PHENETHYLTRICHLOROSILANE · B-PHENYLETHYLTRICHLOROSILANE

https://huagongshe.com/ko/chemical/70327

(2-Phenylethyl)trichlorosilane 분자 구조식

식별자 및 물리적 특성

CAS No.940-41-0
분자식C8H9Cl3Si
평균 분자량239.6 g/mol
단동위원소 질량237.95390986 g/mol
SMILESCl[Si](Cl)(Cl)CCc1ccccc1
InChIKeyFMYXZXAKZWIOHO-UHFFFAOYSA-N
PubChem CID70327
EC No.213-371-0
DTXSIDDTXSID9052632

화학 및 물리적 성질

극성 표면적0
수소 결합 공여자 수0
수소 결합 수용자 수0
회전 가능 결합 수2
무거운 원자 수12
형식 전하0
복잡도127
SpringerMaterials PropertiesNuclear quadrupole resonance spectroscopy
끓는 점93-96 °C3 mm Hg(lit.)
밀도1.234 g/mL at 25 °C(lit.)
굴절률n20/D 1.513(lit.)
인화점>230 °F
저장 조건Store at room temperature, keep dry and cool
물리적 상태liquid
비중1.234
BRN2936059
InChI1S/C8H9Cl3Si/c9-12(10,11)7-6-8-4-2-1-3-5-8/h1-5H,6-7H2
InChIKeyFMYXZXAKZWIOHO-UHFFFAOYSA-N
SMILESCl[Si](Cl)(Cl)CCc1ccccc1
EPASilane, trichloro(2-phenylethyl)- (940-41-0)

안전 및 규제

GHS 분류DangerH311 (97.5%): Toxic in contact with skin [Danger Acute toxicity, dermal]P260, P262, P264, P270, P280, P301+P330+P331, P302+P352, P302+P361+P354, P304+P340, P305+P354+P338, P316, P321, P361+P364, P363, P405, and P501 (click each P-code to see the statement)Aggregated GHS information provided per 40 reports by companies from 2 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.
Hazard Classes and CategoriesAcute Tox. 3 (97.5%)
수질 위해 등급(WGK)3
TSCA 등재 상태TSCA listed
RTECS 번호VV6475000
운송 번호(UN)UN 2922 8/PG 2
위험 문구(R)14-21-34
위험 표시C
안전 문구(S)26-36/37/39-45
기존화학 물질KE-28374
F 고인화성물질10-21
위험 등급Acute Tox. 3 DermalSkin Corr. 1B
저장 분류6.1A - Combustible acute toxic Cat. 1 and 2very toxic hazardous materials

용도

용도

Trichloro(phenethyl)silane is a useful reagent for the preparation of fluorinated polyhedral oligomeric silsesquioxanes.

일반 설명

Trichloro(phenethyl)silane (PTS) is a silane based capping agent that can be used to form a self-assembled monolayer (SAM) on a variety of surfaces. It facilitates the surface treatment and modification for effective detection of surface atoms.