23605-74-5O=P(O)(O)CN(CCCCCCN(CP(=O)(O)O)CP(=O)(O)O)CP(=O)(O)OKIDJHPQACZGFTI-UHFFFAOYSA-N안전 정보는 참고용이며, 공급업체의 물질안전보건자료(SDS), 관련 법규 및 전문가 평가를 대체하지 않습니다.
Warning
H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
P264, P264+P265, P280, P302+P352, P305+P351+P338, P321, P332+P317, P337+P317, and P362+P364 (click each P-code to see the statement)
Aggregated GHS information provided per 107 reports by companies from 2 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.
Chemical: Phosphonic acid, [1,6-hexanediylbis[nitrilobis(methylene)]]tetrakis-
Phosphonic acid, 1,6-hexanediylbisnitrilobis(methylene)tetrakis-: Does not have an individual approval but may be used as a component in a product covered by a group standard. It is not approved for use as a chemical in its own right.
용도Hexamethylenediamine-N,N,N'',N''-tetrakis(methylphosphonic Acid) is used in the acute toxicologic evaluation DEQUEST 2051. It is also used in tatar formation inhibition compositions. Hexamethylenediamine-N,N,N'',N''-tetrakis(methylphosphonic Acid) is used in the studies of calcium oxalate crystal growth inhibition by multidentated organic phosphonate.
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23605-74-5DTXSID9066916