Perfluorooctanesulfonyl fluoride

posf · 1,1,2,2 · PERFLUOROOCTANESULFONYL FLUORIDE · FX-8 · FC-8 · 206-200-6 · 50KG/DRUM · Fluorad FX-8

식별자 및 물리적 특성

CAS No.	307-35-7
분자식	C8F18O2S
평균 분자량	502.12 g/mol
단동위원소 질량	501.9331582 g/mol
SMILES	O=S(=O)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F
InChIKey	BHFJBHMTEDLICO-UHFFFAOYSA-N
PubChem CID	9388
ChEBI	CHEBI:81538
EC No.	206-200-6
DTXSID	DTXSID5027140

화학 및 물리적 성질

XLogP	6
극성 표면적	42.5
수소 결합 공여자 수	0
수소 결합 수용자 수	20
회전 가능 결합 수	7
무거운 원자 수	29
형식 전하	0
복잡도	724
물질 분류	Other Classes -> Other Organic Compounds
PFAS	PFASPFAS -> OECD CategoryPFAS -> Perfluoroalkane sulfonyl fluoride (PASF)-based substancesPFAS -> Other/unspecified
밀도	1.824 g/mL at 25 °C1.824 g/mL at 25 °C(lit.)
Color/Form	Liquid
끓는 점	154 °C154-155 °C(lit.)
증기 밀도	>1 (Air = 1)>1 (vs air)
Physical Description	Clear liquid[MSDSonline]
녹는점	-1 °C
증기압	<10 mm Hg ( 20 °C)
굴절률	n20/D 1.301
인화점	>100°C
용해도	클로로포름(약간 용해됨), 메탄올(약간 용해됨)
물리적 상태	액체
색상	무색~황색
비중	1.81
BRN	1718067
헨리 상수	1.5×10-7 mol/(m3Pa) at 25℃, HSDB (2015)
안정성	흡습성, 수분 민감성
InChI	1S/C8F18O2S/c9-1(10,3(13,14)5(17,18)7(21,22)23)2(11,12)4(15,16)6(19,20)8(24,25)29(26,27)28
InChIKey	BHFJBHMTEDLICO-UHFFFAOYSA-N
SMILES	FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)S(F)(=O)=O
NIST	Perfluoro-1-octanesulfonyl fluoride(307-35-7)
EPA	Perfluorooctylsulfonyl fluoride (307-35-7)

화학적 성질

clear colourless liquid

안전 및 규제

GHS 분류	DangerH301 (47.4%): Toxic if swallowed [Danger Acute toxicity, oral]P203, P260, P261, P264, P264+P265, P270, P271, P273, P280, P301+P316, P301+P330+P331, P302+P361+P354, P304+P340, P305+P354+P338, P316, P317, P318, P319, P321, P330, P363, P391, P403+P233, P405, and P501 (click each P-code to see the statement)Aggregated GHS information provided per 78 reports by companies from 4 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.H301: Toxic if swallowed [Danger Acute toxicity, oral]
규제 정보	Chemical: 1-Octanesulfonyl fluoride, 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluoro-S - indicates a substance that is identified in a final Significant New Use Rule.Status: Cease Manufacture Update: 18-11-2010 https://echa.europa.eu/registration-dossier/-/registered-dossier/12501Substance: Heptadecafluorooctanesulphonyl fluoride
기타 안전 정보	IMAP assessments - Perfluorooctane sulfonate (PFOS) and its Direct Precursors: Human health tier II assessment
유해성 요약	Emergency treatment: Fluoride[HSDB] Repeated high-dose studies have shown the liver to be the primary target organEffects observed in reproductive studies include increase in neonatal mortalityMulti-generational studies showed no effects to post-natal neurological development or to fertility in offspringNo evidence of mutagenicityPerfluorooctanesulfonyl fluoride (POSF) based fluorochemicals can be absorbed into the body and metabolized into perfluorooctanesulfonate (PFOS)Monitoring of PFOS has been used to measure employee exposure to POSF based chemicals in manufacturing[EPA] See Perfluorooctane sulfonic acid.
TSCA 요건	Certain perfluoroalkyl sulfonates. (a) Chemical substances and significant new uses subject to reporting. (1) The chemical substances listed in Table 1 /including 1-Octanesulfonyl fluoride, 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluoro-/ ... of this section are subject to reporting under this section for the significant new uses described in paragraph (a)(2) of this section. ... (2) The significant new uses are: ... (ii) Any manufacture or import for any use of any chemical substance listed in Table 2 of paragraph (a)(1) of this section, except as noted in paragraph (a)(3) of this section. ... (3) Manufacture or import of any chemical substance listed in Table 2 ... for the following specific uses shall not be considered as a significant new use subject to reporting under this section: (i) Use as an anti-erosion additive in fire-resistant phosphate ester aviation hydraulic fluids. (ii) Use as a component of a photoresist substance, including a photo acid generator or surfactant, or as a component of an anti-reflective coating, used in a photomicrolithography process to produce semiconductors or similar components of electronic or other miniaturized devices. (iii) Use in coating for surface tension, static discharge, and adhesion control for analog and digital imaging films, papers, and printing plates, or as a surfactant in mixtures used to process imaging films. (iv) Use as an intermediate only to produce other chemical substances to be used solely for the uses listed in paragraph (a)(3)(i), (ii), or (iii) of this section.