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Toluene → HCID 178423709, 화합물

HRID 1047653
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HRID 1047653 반응식
[N-:1]=[N+:2]=[N-:3].[Na+].[C:5]1(C)[CH:10]=[CH:9][CH:8]=[CH:7][C:6]=1[C:11]1[CH:18]=[CH:17][CH:16]=[CH:15][C:12]=1[C:13]#[N:14].[C:20]1(C)C=CC=CC=1>>[CH3:20][C:9]1[CH:10]=[CH:5][C:6]([C:11]2[CH:18]=[CH:17][CH:16]=[CH:15][C:12]=2[C:13]2[NH:14][N:3]=[N:2][N:1]=2)=[CH:7][CH:8]=1
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 3

HCID 1140TolueneHCID 33557Sodium AzideHCID 112177752-(2-methylphenyl)benzonitrile

생성물 1

HCID 178423709HCID 178423709, 화합물

반응 조건

온도
100 °C

실험 절차

A 20 ml flask is dried under argon and then charged with 7 ml of diisobutylaluminium fluoride (1 molar in hexane) followed by 5 ml of toluene and 455 mg of NaN3 (7 mmol). After stirring the suspension for 4 hours at room temperature 966 mg of solid ortho-tolylbenzonitrile (OTBN) is added at 0° C. in one portion. The suspension is warmed up to 130° C. (ext. temp.) with an internal temperature of 100° C. After 44 h at 130° C. (ext. temp.) the conversion is >93%. The reaction mixture was quenched in hydrochloric acid (6 molar). After addition of 10 ml of toluene the layers are separated, the organic layer is washed twice with 20 ml of water, dried over sodium sulfate and evaporated to give a crystalline residue of the product.

후처리

  1. customA 20 ml flask is dried under argon
  2. additioncharged with 7 ml of diisobutylaluminium fluoride (1 molar in hexane)
  3. additionis added at 0° C. in one portion
  4. customThe reaction mixture was quenched in hydrochloric acid (6 molar)
  5. additionAfter addition of 10 ml of toluene the layers
  6. customare separated
  7. washthe organic layer is washed twice with 20 ml of water
  8. dry with materialdried over sodium sulfate
  9. customevaporated
  10. customto give a crystalline residue of the product

출처 및 근거

ORD 기록
ord-35cd4033b06c4bdca35969908b8719cc
출처 데이터셋
uspto-grants-2013_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08569528B2

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