N-(3-{6-[1-(4-Methoxybenzyl)-1H-pyrazol-4-yl]-1H-imidazo[1,2-b]pyrazol-1-yl}-4-methyl-phenyl)-3-(4-methylpiperazin-1-yl)-5-(pentafluoro-lambda6-sulphanyl)benzamide → 3-(4-Methylpiperazin-1-yl)-N-{4-methyl-3-[6-(1H-pyrazol-4-yl)-1H-imidazo[1,2-b]pyrazol-1-yl]-phenyl}-5-(pentafluoro-lambda6-sulphanyl)benzamide

HRID 1055703노트

반응식

HRID 1055703 반응식
COC1C=CC(C[N:8]2[CH:12]=[C:11]([C:13]3[CH:14]=[C:15]4[N:20]([C:21]5[CH:22]=[C:23]([NH:28][C:29](=[O:49])[C:30]6[CH:35]=[C:34]([S:36]([F:41])([F:40])([F:39])([F:38])[F:37])[CH:33]=[C:32]([N:42]7[CH2:47][CH2:46][N:45]([CH3:48])[CH2:44][CH2:43]7)[CH:31]=6)[CH:24]=[CH:25][C:26]=5[CH3:27])[CH:19]=[CH:18][N:16]4[N:17]=3)[CH:10]=[N:9]2)=CC=1>FC(F)(F)C(O)=O>[CH3:48][N:45]1[CH2:46][CH2:47][N:42]([C:32]2[CH:31]=[C:30]([CH:35]=[C:34]([S:36]([F:41])([F:38])([F:37])([F:39])[F:40])[CH:33]=2)[C:29]([NH:28][C:23]2[CH:24]=[CH:25][C:26]([CH3:27])=[C:21]([N:20]3[C:15]4[N:16]([N:17]=[C:13]([C:11]5[CH:10]=[N:9][NH:8][CH:12]=5)[CH:14]=4)[CH:18]=[CH:19]3)[CH:22]=2)=[O:49])[CH2:43][CH2:44]1

참가 물질

3

실험 절차

At 80° C., 90 mg (0.12 mmol) of the compound of Example 48A were stirred in 0.61 ml of trifluoroacetic acid for 3 h. The reaction was then concentrated and the residue was purified by preparative HPLC (Method 18). The product fractions were concentrated, and the residue was dissolved in ethyl acetate and washed successively with saturated potassium carbonate solution and saturated sodium chloride solution. The organic phase was dried over sodium sulphate, filtered and concentrated under reduced pressure. Drying of the residue under high vacuum gave 40 mg (53% of theory) of the title compound.

후처리

  1. concentrationThe reaction was then concentrated
  2. customthe residue was purified by preparative HPLC (Method 18)
  3. concentrationThe product fractions were concentrated
  4. dissolutionthe residue was dissolved in ethyl acetate
  5. washwashed successively with saturated potassium carbonate solution and saturated sodium chloride solution
  6. dry with materialThe organic phase was dried over sodium sulphate
  7. filtrationfiltered
  8. concentrationconcentrated under reduced pressure
  9. customDrying of the residue under high vacuum

출처 및 근거

ORD 기록
ord-e0d1b8d4bccd43ed93c9ced54555c752
출처 데이터셋
uspto-grants-2016_07
특허 번호
US09394309B2

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