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Acetic Acid → HCID 178458885, 화합물

HRID 1084671
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HRID 1084671 반응식
[C:1]([C:5]1[C:6](=[O:20])[CH2:7][CH:8]([C:12]2[CH:17]=[CH:16][C:15]([S:18][CH3:19])=[CH:14][CH:13]=2)[CH2:9][C:10]=1[OH:11])(=[O:4])[CH2:2][CH3:3].C(O)(=[O:23])C.OO>C(Cl)Cl>[C:1]([C:5]1[C:6](=[O:20])[CH2:7][CH:8]([C:12]2[CH:13]=[CH:14][C:15]([S:18]([CH3:19])=[O:23])=[CH:16][CH:17]=2)[CH2:9][C:10]=1[OH:11])(=[O:4])[CH2:2][CH3:3]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 176Acetic Acid2회HCID 784Hydrogen Peroxide2회HCID 178458883HCID 178458883, 화합물

생성물 1

HCID 178458885HCID 178458885, 화합물

시약·촉매·용매 1

HCID 6344Dichloromethane용매2회

실험 절차

To a solution of 51.6 g (0.178 mol) of 2-propionyl-3-hydroxy-5-(4-methylthiophenyl)cyclohex-2-en-1-one (prepared as in U.S. Pat. No. 4,555,263) in 150 mL of methylene chloride and 150 mL of glacial acetic acid was added 20.15 g (0.178 mol) of 30 percent hydrogen peroxide dropwise over 20 minutes. The reaction temperature rose 20° to 28° C. at which point, the reaction mixture was cooled in a cold water bath. After 20 minutes, an additional 6.75 g (0.0595 mol) of 30 percent hydrogen peroxide was added dropwise and the mixture was stirred at ambient temperature for 3 hours. The mixture was diluted with 150 mL of methylene chloride, washed thrice with 250 mL portions of water and then with 200 mL of aqueous sodium bicarbonate. The organic layer was separated and dried over Na2SO4 and the solvent removed in vacuo leaving 51.6 g (94.8 percent of theoretical) of the above named product melting at 111°-117° C. Recrystallization of the residue from 2-propanol gave the pure product in a yield of 46.1 g (84.7 percent of theoretical). The product melted at 116°-117° C.; Rf -0.07 (silica gel, 50:50 ethyl acetatehexane and 1.0 percent acetic acid), 1H NMR (CDCl3): δ1.1 (t, 3H, --CH2CH3), 2.70 (s, 3H, CH3SO--), 2.7-3.7 (m, 7H, ring protons and --CH2CH3), 7.25-7.70 (m, 4H, ArH), 18.1 (s, 1H, OH).

후처리

  1. customrose 20° to 28° C. at which point
  2. temperaturethe reaction mixture was cooled in a cold water bath
  3. washwashed thrice with 250 mL portions of water
  4. customThe organic layer was separated
  5. dry with materialdried over Na2SO4
  6. customthe solvent removed in vacuo
  7. customleaving 51.6 g (94.8 percent of theoretical) of the
  8. customRecrystallization of the residue from 2-propanol
  9. customgave the pure product in a yield of 46.1 g (84.7 percent of theoretical)

출처 및 근거

ORD 기록
ord-9ac55e0d810446e7b2f31e0158a40e5f
출처 데이터셋
uspto-grants-1991_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05006159

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