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Tetrahydrofuran → HCID 14856359, 화합물

HRID 1089548
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HRID 1089548 반응식
O1CCCC1.[CH3:6][S:7]([NH:10][C:11]1[CH:23]=[CH:22][C:14]2[O:15][CH2:16][CH2:17][NH:18][CH2:19][CH2:20][O:21][C:13]=2[CH:12]=1)(=[O:9])=[O:8].[CH3:24][S:25]([NH:28][C:29]1[CH:37]=[CH:36][C:32]([C:33](Cl)=[O:34])=[CH:31][CH:30]=1)(=[O:27])=[O:26]>N1C=CC=CC=1>[CH3:6][S:7]([NH:10][C:11]1[CH:23]=[CH:22][C:14]2[O:15][CH2:16][CH2:17][N:18]([C:33](=[O:34])[C:32]3[CH:36]=[CH:37][C:29]([NH:28][S:25]([CH3:24])(=[O:27])=[O:26])=[CH:30][CH:31]=3)[CH2:19][CH2:20][O:21][C:13]=2[CH:12]=1)(=[O:8])=[O:9]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 8028TetrahydrofuranHCID 117911194-[(Methylsulfonyl)amino]benzoyl chlorideHCID 14856361HCID 14856361, 화합물

생성물 1

HCID 14856359HCID 14856359, 화합물

시약·촉매·용매 1

HCID 1049Pyridine용매

실험 절차

To tetrahydrofuran add 9-[(methylsulfonyl)amino]-3,4,5,6-tetrahydro-2H-1,7,4-benzodioxazonine, pyridine, and 4-[(methylsulfonyl)amino]benzoyl chloride. Monitor the progress of the reaction by thin-layer chromatography. Upon completion, remove the solvent in vacuo. Partition the residue between aqueous NaHCO3 and EtOAc. Separate the layers and wash the organic layer with 1M aqueous HCl. Separate and dry (Na2SO4) the organic layer. Remove the solvent in vacuo to obtain the title compound.

후처리

  1. customMonitor the progress of the reaction by thin-layer chromatography
  2. customUpon completion, remove the solvent in vacuo
  3. customPartition the residue between aqueous NaHCO3 and EtOAc
  4. customSeparate the layers
  5. washwash the organic layer with 1M aqueous HCl
  6. customSeparate
  7. dry with materialdry (Na2SO4) the organic layer
  8. customRemove the solvent in vacuo

출처 및 근거

ORD 기록
ord-26e0651da25241ccbaa57d73565ce763
출처 데이터셋
uspto-grants-1990_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US04966967

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