홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Trifluoroacetic acid → HCID 68433377, 화합물

HRID 1162846
노트
인쇄 미리보기

반응식

HRID 1162846 반응식
[CH2:1]([O:8][CH2:9][CH:10]([NH:25][C:26](=O)OC(C)(C)C)[CH2:11][N:12]([C:21](=[O:24])CBr)[CH2:13][C:14]1[CH:19]=[CH:18][C:17]([F:20])=[CH:16][CH:15]=1)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.FC(F)(F)C(O)=O>C(Cl)Cl>[CH2:1]([O:8][CH2:9][CH:10]1[CH2:11][N:12]([CH2:13][C:14]2[CH:15]=[CH:16][C:17]([F:20])=[CH:18][CH:19]=2)[C:21](=[O:24])[CH2:26][NH:25]1)[C:2]1[CH:3]=[CH:4][CH:5]=[CH:6][CH:7]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 2

HCID 6422Trifluoroacetic acidHCID 68433262HCID 68433262, 화합물

생성물 1

HCID 68433377HCID 68433377, 화합물

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To a solution of tert-butyl 2-(benzyloxy)-1-{[(bromoacetyl)(4-fluorobenzyl)amino]methyl}ethylcarbamate (2.79 g, 5.47 mmol) in CH2Cl2 (28 mL) was added trifluoroacetic acid (10 ml). The reaction was stirred at ambient temperature under inert atmosphere for 2 h and then concentrated in vacuo, azeotroping the residual oil with CHCl3. The resulting residue was dissolved in CH2Cl2 (100 mL) and treated with Hünig's base (10 mL). The solution was stirred at ambient temperature under inert atmosphere for 18 h. The solvent was removed in vacuo, and the remaining residue was partitioned between EtOAc and saturated aqueous NaHCO3 solution. The organic layer was washed with water and brine, dried over Na2SO4, and concentrated in vacuo. Purification by silica gel chromatography (EtOAc to 10% MeOH/EtOAc) afforded the title compound as a yellow oil. 1H NMR (400 MHz, CDCl3) δ 7.37-7.22 (m, 7H), 7.04-6.98 (m, 2H), 4.64 (d, J=14.8 Hz, 1H), 4.49-4.44 (m, 3H), 3.63 (dd, J=17.6, 41.2 Hz, 2H), 3.47 (dd, J=4.0, 9.6 Hz, 1H), 3.40 (dd, J=6.4, 9.2 Hz, 1H), 3.22-3.16 (m, 1H), 3.10-3.06 (m, 2H), 1.71 (br s, 1H). ES MS (M+1)=329.3.

후처리

  1. concentrationconcentrated in vacuo
  2. customazeotroping the residual oil with CHCl3
  3. dissolutionThe resulting residue was dissolved in CH2Cl2 (100 mL)
  4. additiontreated with Hünig's base (10 mL)
  5. stirringThe solution was stirred at ambient temperature under inert atmosphere for 18 h
  6. customThe solvent was removed in vacuo
  7. customthe remaining residue was partitioned between EtOAc and saturated aqueous NaHCO3 solution
  8. washThe organic layer was washed with water and brine
  9. dry with materialdried over Na2SO4
  10. concentrationconcentrated in vacuo
  11. customPurification by silica gel chromatography (EtOAc to 10% MeOH/EtOAc)

출처 및 근거

ORD 기록
ord-d6e244ef1dc7445d977d79b5671321ae
출처 데이터셋
uspto-grants-2010_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07820680B2

반응 노트

불러오는 중…

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트