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Sodium Carbonate → 4-Phenyl-1-(triphenylmethyl)-1H-pyrazole

HRID 1178107
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HRID 1178107 반응식
C([O-])([O-])=O.[Na+].[Na+].I[C:8]1[CH:9]=[N:10][N:11]([C:13]([C:26]2[CH:31]=[CH:30][CH:29]=[CH:28][CH:27]=2)([C:20]2[CH:25]=[CH:24][CH:23]=[CH:22][CH:21]=2)[C:14]2[CH:19]=[CH:18][CH:17]=[CH:16][CH:15]=2)[CH:12]=1.[C:32]1(B(O)O)[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=1>C1(C)C=CC=CC=1.O.O.C1C=CC([P]([Pd]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1>[C:32]1([C:8]2[CH:9]=[N:10][N:11]([C:13]([C:26]3[CH:31]=[CH:30][CH:29]=[CH:28][CH:27]=3)([C:20]3[CH:25]=[CH:24][CH:23]=[CH:22][CH:21]=3)[C:14]3[CH:19]=[CH:18][CH:17]=[CH:16][CH:15]=3)[CH:12]=2)[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 3

HCID 10340Sodium CarbonateHCID 66827Phenylboronic AcidHCID 153244794-Iodo-1-(triphenylmethyl)-1H-pyrazole

생성물 1

HCID 595596204-Phenyl-1-(triphenylmethyl)-1H-pyrazole수율 48.38%

시약·촉매·용매 3

HCID 178418397HCID 178418397, 화합물촉매
HCID 962
Water
용매
HCID 22272177Toluene water용매

실험 절차

Na2CO3 (146 mg, 1.37 mmol) was added to a stirred solution of 4-iodo-1-trityl-1H-pyrazole (300 mg, 0.69 mmol) in toluene: H2O (5:1, 11.5 mL). Pd (PPh3)4 (80 mg, 0.07 mmol) and phenylboronic acid (126 mg, 1.03 mmol) were then added and the reaction mixture was heated to reflux for 2 hrs. The reaction mixture was then diluted with water and the product was extracted with ethyl acetate. The organic layer was washed with saturated brine solution, dried over sodium sulphate and concentrated to get the residue. The residue obtained was purified by column chromatography (using silica gel of 60-120 mesh and 5% EtOAc in Hexane as eluent) afford 120 mg (48.38% yield) of 4-phenyl-1-trityl-1H-pyrazole. 1H NMR (CDCl3): δ 7.96-7.94 (s, 1H), 7.64-7.6 (s, 1H), 7.46-7.4 (d, 2H), 7.36-7.0 (m, 1H), 7.24-7.16 (m, 7H).

후처리

  1. temperaturethe reaction mixture was heated
  2. temperatureto reflux for 2 hrs
  3. extractionthe product was extracted with ethyl acetate
  4. washThe organic layer was washed with saturated brine solution
  5. dry with materialdried over sodium sulphate
  6. concentrationconcentrated
  7. customto get the residue
  8. customThe residue obtained
  9. customwas purified by column chromatography (using silica gel of 60-120 mesh and 5% EtOAc in Hexane as eluent)

출처 및 근거

ORD 기록
ord-e1febe7ef4dd42d7bfefe2fe8e1ed167
출처 데이터셋
uspto-grants-2010_11
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07842696B2

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