Trifluoroacetic acid → HCID 9863201, 화합물

HRID 1246403노트

반응식

HRID 1246403 반응식
[C:1]([C:9]1[CH:10]=[C:11]([CH2:21][CH2:22][NH:23][C:24](=[O:26])[CH3:25])[C:12]2[C:17]([CH:18]=1)=[CH:16][CH:15]=[C:14]([S:19][CH3:20])[CH:13]=2)(=O)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.FC(F)(F)C(O)=O.[H-].C([SiH](CC)CC)C>>[CH2:1]([C:9]1[CH:10]=[C:11]([CH2:21][CH2:22][NH:23][C:24](=[O:26])[CH3:25])[C:12]2[C:17]([CH:18]=1)=[CH:16][CH:15]=[C:14]([S:19][CH3:20])[CH:13]=2)[C:2]1[CH:3]=[CH:4][CH:5]=[CH:6][CH:7]=1

참가 물질

4

반응물 3

HCID 6422Trifluoroacetic acidHCID 9950905HCID 9950905, 화합물HCID 131724811HCID 131724811, 화합물2회

생성물 1

HCID 9863201HCID 9863201, 화합물

실험 절차

A solution of the product obtained in Example 6 (2.06 mmol) in trifluoroacetic acid (20.6 mmol) is brought to 0° C. and then triethylsilane hydride (6.18 mmol) is added dropwise. Stirring is carried out at ambient temperature for one week and a fourth equivalent of triethylsilane hydride is then added. The reaction mixture is stirred for 24 hours more and is then hydrolysed and extracted with ethyl acetate. The organic phase is washed with water, dried over magnesium sulphate and evaporated. The residue is chromatographed on silica gel (eluant: acetone/toluene/cyclohexane 30/50/20) and is then recrystallised twice from toluene to yield the title product in the form of a white solid.

후처리

  1. customis brought to 0° C.
  2. waitis carried out at ambient temperature for one week
  3. stirringThe reaction mixture is stirred for 24 hours more
  4. extractionhydrolysed and extracted with ethyl acetate
  5. washThe organic phase is washed with water
  6. dry with materialdried over magnesium sulphate
  7. customevaporated
  8. customThe residue is chromatographed on silica gel (eluant: acetone/toluene/cyclohexane 30/50/20)
  9. customis then recrystallised twice from toluene

출처 및 근거

ORD 기록
ord-b36d8a37399f49938035d42b9a396f1e
출처 데이터셋
uspto-grants-2006_10
특허 번호
US07126012B2

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