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Trifluoroacetic acid → HCID 20131150, 화합물

HRID 1380128
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HRID 1380128 반응식
[C:1]1([CH2:7][CH2:8][CH2:9][CH:10]2[CH2:12]O2)[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.C1(P(=[S:32])(C2C=CC=CC=2)C2C=CC=CC=2)C=CC=CC=1.FC(F)(F)C(O)=O>C1(C)C=CC=CC=1>[C:1]1([CH2:7][CH2:8][CH2:9][CH:10]2[CH2:12][S:32]2)[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 6422Trifluoroacetic acidHCID 19758Phosphine sulfide, triphenyl-HCID 108557952-(3-Phenylpropyl)oxirane

생성물 1

HCID 20131150HCID 20131150, 화합물

시약·촉매·용매 1

HCID 1140Toluene용매

실험 절차

To a stirred solution of 2-(3-phenylpropyl)oxirane (Example 35b) (2.0 g, 0.0123 mol) and triphenylphosphine sulphide (3.62 g, 0.0123 mol) in toluene (20 ml), trifluoroacetic acid (1.40 g, 0.0123 mol) was added over 5 min. After stirring for 1 hour at room temperature, the reaction mixture was washed with water, sodium hydrogen carbonate solution and again with water. After drying (MgSO4) and removal of solvent at reduced pressure, the product contaminated with triphenylphosphine oxide was isolated as a crystalline mass. Attempted purification of the thiirane resulted in its extensive decomposition and it was therefore used in its crude state.

후처리

  1. washthe reaction mixture was washed with water, sodium hydrogen carbonate solution and again with water
  2. customAfter drying
  3. custom(MgSO4) and removal of solvent at reduced pressure
  4. customwas isolated as a crystalline mass
  5. customAttempted purification of the thiirane
  6. customresulted in its extensive decomposition and it

출처 및 근거

ORD 기록
ord-115d8037d91944508645fdac87cbb977
출처 데이터셋
uspto-grants-1986_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US04579862

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