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Cyclohexene oxide → HCID 16738222, 화합물

HRID 1393510
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HRID 1393510 반응식
[O:1]1[C:5]2([CH2:9][CH2:8][NH:7][CH2:6]2)[O:4][CH2:3][CH2:2]1.[CH:10]12[O:16][CH:11]1[CH2:12][CH2:13][CH2:14][CH2:15]2>O>[O:1]1[C:5]2([CH2:9][CH2:8][N:7]([C@H:10]3[CH2:15][CH2:14][CH2:13][CH2:12][C@@H:11]3[OH:16])[CH2:6]2)[O:4][CH2:3][CH2:2]1
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참가 물질

4

반응물 2

HCID 9246Cyclohexene oxideHCID 151650391,4-Dioxa-7-azaspiro(4.4)nonane

생성물 1

HCID 16738222HCID 16738222, 화합물수율 79%

시약·촉매·용매 1

HCID 962Water용매

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온도
80 °C

실험 절차

A mixture of 1e (23.5 g, no more than 182 mmol), cyclohexene oxide (23 mL, 220 mmol) and water (8 mL) was heated at 80° C. for 2 h. The reaction mixture was then partitioned between 40% NaOH aq (60 mL) and Et2O (120 mL). The basic aqueous layer was extracted twice more with Et2O (2×120 mL). The combined organic extracts were dried and concentrated in vacuo. The residue was then heated under high vacuum at 50° C. for 1 h with stirring (to remove the excess of cyclohexene oxide) to yield 32.8 g of 2e (79% yield); as illustrated in FIG. 2. Rf 0.33 (EtOAc-iPrNrH2, 98:2,v/v); 13C NMR (50 MHz, APT, CDCl3) δ 115.5 (+), 70.0 (−), 65.0 (−), 64.5 (+), 57.0 (+), 46.5 (+), 36.0 (+), 33.5 (+), 25.0 (+), 24.0 (+), 21.5 (+); IR (film) 3457 cm−1.

후처리

  1. customThe reaction mixture was then partitioned between 40% NaOH aq (60 mL) and Et2O (120 mL)
  2. extractionThe basic aqueous layer was extracted twice more with Et2O (2×120 mL)
  3. customThe combined organic extracts were dried
  4. concentrationconcentrated in vacuo
  5. temperatureThe residue was then heated under high vacuum at 50° C. for 1 h
  6. customto remove the excess of cyclohexene oxide)

출처 및 근거

ORD 기록
ord-f83329d2718c4a46b2be25b0ac25f397
출처 데이터셋
uspto-grants-2008_03
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07345087B2

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