Potassium Hydroxide → (E)-2-methyl-5-(2-(pyridin-4-yl)prop-1-enyl)-2,3,4,5-tetrahydro-1H-pyrido[4,3-b]indole

HRID 1401494노트

반응식

HRID 1401494 반응식
[CH3:1][N:2]1[CH2:24][CH2:23][C:5]2[N:6]([CH2:13][C:14]([C:17]3[CH:22]=[CH:21][N:20]=[CH:19][CH:18]=3)(O)[CH3:15])[C:7]3[CH:8]=[CH:9][CH:10]=[CH:11][C:12]=3[C:4]=2[CH2:3]1.[OH-].[K+]>S(Cl)(Cl)=O>[CH3:1][N:2]1[CH2:24][CH2:23][C:5]2[N:6](/[CH:13]=[C:14](/[C:17]3[CH:18]=[CH:19][N:20]=[CH:21][CH:22]=3)\[CH3:15])[C:7]3[CH:8]=[CH:9][CH:10]=[CH:11][C:12]=3[C:4]=2[CH2:3]1

참가 물질

4

반응물 2

HCID 14797Potassium HydroxideHCID 497795901-(2-methyl-3,4-dihydro-1H-pyrido[4,3-b]indol-5(2H)-yl)-2-(pyridin-4-yl)propan-2-ol

생성물 1

HCID 59454924(E)-2-methyl-5-(2-(pyridin-4-yl)prop-1-enyl)-2,3,4,5-tetrahydro-1H-pyrido[4,3-b]indole

시약·촉매·용매 1

HCID 24386Thionyl Chloride용매

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온도
100 °C

실험 절차

1-(1,2,3,4-Tetrahydro-2-methylpyrido[4,3-b]indol-5-yl)-2-(pyridin-4-yl)propan-2-ol (600 mg, 1.86 mmol) was dissolved in thionyl chloride (8 mL) and the solution was stirred for 1 h. Excess thionyl chloride was removed under reduced pressure and the residue was dissolved in N-methyl-2-pyrrolidone (3 mL) and the solution was stirred for 5 min. at RT. Powdered KOH (690 mg, 12.32 mmol) was added and the reaction mixture was heated at 100° C. for 1-2 h. The reaction mixture was cooled to RT, diluted with ice water and extracted with EtOAc. The organic layer washed with water, dried over sodium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel chromatography eluting with 2% MeOH-DCM. 1H NMR (CD3OD, HCl salt) δ (ppm): 8.85 (d, 2H), 8.40 (d, 2H), 7.82 (d, 1H), 7.60 (d, 1H), 7.30 (m, 2H), 7.20 (m, 1H), 4.80 (d, 1H), 4.40 (d, 1H), 3.90 (m, 1H), 3.60 (m, 2H), 3.20 (m, 1H), 3.10 (s, 3H), 2.20 (s, 3H).

후처리

  1. customExcess thionyl chloride was removed under reduced pressure
  2. dissolutionthe residue was dissolved in N-methyl-2-pyrrolidone (3 mL)
  3. stirringthe solution was stirred for 5 min. at RT
  4. temperatureThe reaction mixture was cooled to RT
  5. extractionextracted with EtOAc
  6. washThe organic layer washed with water
  7. dry with materialdried over sodium sulfate
  8. concentrationconcentrated under reduced pressure
  9. customThe residue was purified by silica gel chromatography
  10. washeluting with 2% MeOH-DCM

출처 및 근거

ORD 기록
ord-ace6d5b139eb45fdaec7ef174cfb6e66
출처 데이터셋
uspto-grants-2014_12
특허 번호
US08907097B2

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