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llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
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Trifluoroacetic acid → HCID 61368903, 화합물

HRID 1430225
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HRID 1430225 반응식
[CH2:1]([N:8](C(OC(C)(C)C)=O)[NH:9][CH2:10][CH2:11][C:12](=O)[C:13]1[CH:18]=[CH:17][CH:16]=[CH:15][CH:14]=1)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.C(O)(C(F)(F)F)=O>ClCCl>[CH2:1]([N:8]1[C:12]([C:13]2[CH:18]=[CH:17][CH:16]=[CH:15][CH:14]=2)=[CH:11][CH:10]=[N:9]1)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 2

HCID 6422Trifluoroacetic acidHCID 89498414HCID 89498414, 화합물

생성물 1

HCID 61368903HCID 61368903, 화합물

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To a solution of EXAMPLE 65D (3.1 g) in dichloromethane (10 mL) was added TFA (10 mL) and the mixture was stirred overnight. The mixture was concentrated under vacuum and the residue was dissolved in ethyl acetate (300 mL) and washed with 2N aqueous NaOH, water and brine. The combined organic layers were concentrated, and the residue was dissolved in dichloroethane (30 mL) and MnO2 (2.5 g) was added. The mixture was stirred overnight. Filtration and evaporation of the solvent provided the title compound.

후처리

  1. concentrationThe mixture was concentrated under vacuum
  2. dissolutionthe residue was dissolved in ethyl acetate (300 mL)
  3. washwashed with 2N aqueous NaOH, water and brine
  4. concentrationThe combined organic layers were concentrated
  5. dissolutionthe residue was dissolved in dichloroethane (30 mL)
  6. additionMnO2 (2.5 g) was added
  7. stirringThe mixture was stirred overnight
  8. filtrationFiltration and evaporation of the solvent

출처 및 근거

ORD 기록
ord-c466ff72a8544ac1a39548b4f123f65d
출처 데이터셋
uspto-grants-2015_01
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08940737B2

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