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Hydrogen Peroxide → 2-Cyclopentylmethyl-3-[formyl-(tetrahydro-pyran-2-yloxy)-amino]-propionic acid

HRID 1434904
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HRID 1434904 반응식
C(C1COC(=O)N1[C:14](=[O:33])[CH:15]([CH2:27][CH:28]1[CH2:32][CH2:31][CH2:30][CH2:29]1)[CH2:16][N:17]([O:20][CH:21]1[CH2:26][CH2:25][CH2:24][CH2:23][O:22]1)[CH:18]=[O:19])C1C=CC=CC=1.C1C[O:37]CC1.O.OO>[Cl-].[Na+].O>[CH:28]1([CH2:27][CH:15]([CH2:16][N:17]([CH:18]=[O:19])[O:20][CH:21]2[CH2:26][CH2:25][CH2:24][CH2:23][O:22]2)[C:14]([OH:33])=[O:37])[CH2:29][CH2:30][CH2:31][CH2:32]1
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참가 물질

6

반응물 4

HCID 784Hydrogen PeroxideHCID 962WaterHCID 8028TetrahydrofuranHCID 76652336HCID 76652336, 화합물

생성물 1

HCID 766523532-Cyclopentylmethyl-3-[formyl-(tetrahydro-pyran-2-yloxy)-amino]-propionic acid수율 50%

시약·촉매·용매 1

HCID 57417360
Sodium chloride; water
용매

실험 절차

N-[3-(4-Benzyl-2-oxo-oxazolidin-3-yl)-2-cyclopentylmethyl-3-oxo-propyl]-N-(tetrahydro-pyran-2-yloxy)-formamide (3.65 g, 7.96 mmol), THF (125 mL), and water (40 mL) is cooled to 4° C. To this mixture, is added 30% H2O2 (5.2 mL, 50.90 mmole) and LiOH monohydrate (0.40 g, 9.53 mmol), respectively. The reaction mixture is stirred for 1.5 hours. The mixture is slowly quenched with 0.5 M Na2SO3, while maintaining the temperature below 15° C. with an ice bath. The quenched mixture is stirred for an addition 30 minutes, concentrated in vacuo until the THF solvent is removed, and washed with EtOAc. The basic reaction mixture is acidified with Amberlite IR-120 resin (H+) to pH=4.5. Brine is added to the acidic solution, and the combined mixture is extracted with EtOAc. The organic layers from the acidic solution washing are combined, dried over Na2SO4, and concentrated in vacuo. This gave 2-cyclopentylmethyl-3-[formyl-(tetrahydro-pyran-2-yloxy)-amino]-propionic acid (1.20 g, 50% yield) as an oil.

후처리

  1. customThe mixture is slowly quenched with 0.5 M Na2SO3
  2. temperaturewhile maintaining the temperature below 15° C. with an ice bath
  3. stirringThe quenched mixture is stirred for an addition 30 minutes
  4. concentrationconcentrated in vacuo until the THF solvent
  5. customis removed
  6. washwashed with EtOAc
  7. customThe basic reaction mixture
  8. extractionthe combined mixture is extracted with EtOAc
  9. washThe organic layers from the acidic solution washing
  10. dry with materialdried over Na2SO4
  11. concentrationconcentrated in vacuo

출처 및 근거

ORD 기록
ord-361ed2e3cd464f2b965cf3ecda073652
출처 데이터셋
uspto-grants-2009_11
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07615635B2

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