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Nitric Acid → 1-Amino-5-fluoro-4-nitronaphthalene

HRID 1441786
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HRID 1441786 반응식
[F:1][C:2]1[CH:11]=[CH:10][CH:9]=[C:8]2[C:3]=1[CH:4]=[CH:5][CH:6]=[C:7]2[NH:12]C(=O)C.[N+:16]([O-])([OH:18])=[O:17]>CC(O)=O>[NH2:12][C:7]1[C:8]2[C:3](=[C:2]([F:1])[CH:11]=[CH:10][CH:9]=2)[C:4]([N+:16]([O-:18])=[O:17])=[CH:5][CH:6]=1
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참가 물질

4

반응물 2

HCID 944Nitric AcidHCID 21874908HCID 21874908, 화합물

생성물 1

HCID 218752881-Amino-5-fluoro-4-nitronaphthalene수율 27%

시약·촉매·용매 1

HCID 176Acetic Acid용매

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온도
10 °C

실험 절차

Compound 209A (133 mg, 0.645 mmol) was dissolved in 1 mL AcOH and the resulting solution was cooled to 10° C. At this temperature, 80.0 μL (2.00 mmol) of red fuming HNO3 was added and stirring was continued for 15 min before the reaction was quenched by the addition of crushed ice. The aqueous layer was extracted with CH2Cl2 and the combined organic phases were dried over MgSO4 and concentrated in vacuo. The resulting residue was dissolved in 3 mL EtOH, heated to reflux and treated with 0.5 mL of 40% aqueous NaOH solution. Stirring was continued for 15 min before the reaction was cooled and diluted with H2O. The aqueous layer was extracted with CH2Cl2 and the combined organic phases were dried over MgSO4 and concentrated in vacuo. The resulting residue was purified by flash chromatography on silica gel, eluting with 40 to 70% EtOAc in hexane to afford 36 mg (0.17 mmol, 27%) of compound 209B as a yellow solid.

후처리

  1. customwas quenched by the addition of crushed ice
  2. extractionThe aqueous layer was extracted with CH2Cl2
  3. dry with materialthe combined organic phases were dried over MgSO4
  4. concentrationconcentrated in vacuo
  5. dissolutionThe resulting residue was dissolved in 3 mL EtOH
  6. temperatureheated
  7. temperatureto reflux
  8. additiontreated with 0.5 mL of 40% aqueous NaOH solution
  9. stirringStirring
  10. waitwas continued for 15 min before the reaction
  11. temperaturewas cooled
  12. additiondiluted with H2O
  13. extractionThe aqueous layer was extracted with CH2Cl2
  14. dry with materialthe combined organic phases were dried over MgSO4
  15. concentrationconcentrated in vacuo
  16. customThe resulting residue was purified by flash chromatography on silica gel
  17. washeluting with 40 to 70% EtOAc in hexane

출처 및 근거

ORD 기록
ord-d78f54f7b0824f1cae9faa8feb85e4f2
출처 데이터셋
uspto-grants-2010_02
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07655689B2

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