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Di(pentafluorophenyl)chloroethoxysilane → Ethoxy[tris(pentafluorophenyl)]silane

HRID 1452557
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인쇄 미리보기

반응식

HRID 1452557 반응식
[F:1][C:2]1[C:7]([SiH:8]([C:13]2[C:18]([F:19])=[C:17]([F:20])[C:16]([F:21])=[C:15]([F:22])[C:14]=2[F:23])[O:9][CH2:10][CH2:11]Cl)=[C:6]([F:24])[C:5]([F:25])=[C:4]([F:26])[C:3]=1[F:27].[C:28]1([Li])[C:37]([F:38])=[C:35]([F:36])[C:33]([F:34])=[C:31]([F:32])[C:29]=1[F:30]>CCOCC>[F:38][C:37]1[C:28]([C:11]([C:13]2[C:14]([F:23])=[C:15]([F:22])[C:16]([F:21])=[C:17]([F:20])[C:18]=2[F:19])([C:28]2[C:37]([F:38])=[C:35]([F:36])[C:33]([F:34])=[C:31]([F:32])[C:29]=2[F:30])[CH2:10][O:9][SiH3:8])=[C:29]([F:30])[C:31]([F:32])=[C:33]([F:34])[C:35]=1[F:36].[Si:8]([O:9][CH2:10][CH3:11])([C:28]1[C:29]([F:30])=[C:31]([F:32])[C:33]([F:34])=[C:35]([F:36])[C:37]=1[F:38])([C:13]1[C:18]([F:19])=[C:17]([F:20])[C:16]([F:21])=[C:15]([F:22])[C:14]=1[F:23])[C:7]1[C:6]([F:24])=[C:5]([F:25])[C:4]([F:26])=[C:3]([F:27])[C:2]=1[F:1]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 2

HCID 131724616Di(pentafluorophenyl)chloroethoxysilaneHCID 178419089HCID 178419089, 화합물

생성물 2

HCID 23523565Ethoxy[tris(pentafluorophenyl)]silaneHCID 131724617Tri(pentafluorophenyl)ethoxysilane

시약·촉매·용매 1

HCID 3283Diethyl Ether용매2회

실험 절차

88.54 g (0.200 mol) of di(pentafluorophenyl)chloroethoxysilane in Et2O is slowly added to solution of C6F5—Li (0.200 mol, 34.80 g, prepared in situ) in Et2O at −78° C. The solution is stirred for over night allowing it to warm up to room temperature. Formed clear solution is filtered and evaporated to dryness to result tri(pentafluorophenyl)ethoxysilane, (C6F5)3SiOEt.

후처리

  1. customFormed clear solution
  2. filtrationis filtered
  3. customevaporated to dryness

출처 및 근거

ORD 기록
ord-b52079009fb04fe6889fd710e9879989
출처 데이터셋
uspto-grants-2009_01
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07473650B2

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