홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Water → HCID 22103733, 화합물

HRID 1457208
노트
인쇄 미리보기

반응식

HRID 1457208 반응식
[CH3:1][C:2]1[C:6]([CH3:7])=[C:5]([N:8](COCCOC)[S:9]([C:12]2[C:13]([C:18]3[CH:23]=[CH:22][C:21]([C:24]4[O:25][CH:26]=[CH:27][N:28]=4)=[CH:20][C:19]=3[CH:29]([OH:41])[C:30]3[O:31][C:32]([C:35]4[CH:40]=[CH:39][CH:38]=[CH:37][CH:36]=4)=[CH:33][N:34]=3)=[CH:14][CH:15]=[CH:16][CH:17]=2)(=[O:11])=[O:10])[O:4][N:3]=1.[Si](Cl)(C)(C)C.[Na+].[I-].O>CC#N.CCOC(C)=O>[CH3:1][C:2]1[C:6]([CH3:7])=[C:5]([NH:8][S:9]([C:12]2[C:13]([C:18]3[CH:23]=[CH:22][C:21]([C:24]4[O:25][CH:26]=[CH:27][N:28]=4)=[CH:20][C:19]=3[CH:29]([OH:41])[C:30]3[O:31][C:32]([C:35]4[CH:40]=[CH:39][CH:38]=[CH:37][CH:36]=4)=[CH:33][N:34]=3)=[CH:14][CH:15]=[CH:16][CH:17]=2)(=[O:10])=[O:11])[O:4][N:3]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 4

HCID 962WaterHCID 5238Sodium Iodide2회HCID 6397Chlorotrimethylsilane2회HCID 22103475N-(3,4-Dimethyl-5-isoxazolyl)-2′-[hydroxy(5-phenyl-2-oxazolyl)methyl]-N-[(2-methoxyethoxy)methyl]-4′-(2-oxazolyl)[1,1′-biphenyl]-2-sulfonamide

생성물 1

HCID 22103733HCID 22103733, 화합물

시약·촉매·용매 2

HCID 6342
Acetonitrile
용매
HCID 8857Ethyl Acetate용매

실험 절차

To a solution of the title compound of Step (B) (200 mg, 0.305 mmol) in 10.2 ml of CH3CN, Me3SiCl (199 mg, 1.83 mmol) was added and followed by NaI (274 mg, 1.83 mmol). The mixture was stirred at room temperature for 1 hr. Additional Me3SiCl (199 mg, 1.83 mmol) and NaI (274 mg, 1.83 mmol) were added in three portions and the reaction was stirred for additional 5.5 hr. The mixture was added to 5 ml H2O and 50 ml EtOAc. The organic layer was washed with sat. Na2S2 O3, brine, dried and concentrated. The residue was purified by preparative HPLC on an ODS S10 column using 27% solvent A (10% MeOH, 90% H2O, 0.1% TFA) and 73% solvent B (90% MeOH, 10% H2O, 0.1% TFA) to provide the title compound of this Example (65 mg, 37%) as a white solid, m.p. 125°-135° C. (amorphous).

후처리

  1. stirringthe reaction was stirred for additional 5.5 hr
  2. washThe organic layer was washed with sat. Na2S2 O3, brine
  3. customdried
  4. concentrationconcentrated
  5. customThe residue was purified by preparative HPLC on an ODS S10 column

출처 및 근거

ORD 기록
ord-09765838cc434195b83161283124a2c8
출처 데이터셋
uspto-grants-1998_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05846990

반응 노트

불러오는 중…

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트