홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Dimethylformamide → N,N'-(13-oxo-3,6,9,17,20,23-hexaoxa-12,14-diazapentacosane-1,25-diyl)bis[4-(2,6-difluoro-4-(2-carboethoxypropenyl)phenoxy)benzenesulfonamide]

HRID 1470131
노트
인쇄 미리보기

반응식

HRID 1470131 반응식
[NH2:1][CH2:2][CH2:3][O:4][CH2:5][CH2:6][O:7][CH2:8][CH2:9][O:10][CH2:11][CH2:12][NH:13][S:14]([C:17]1[CH:39]=[CH:38][C:20]([O:21][C:22]2[C:27]([F:28])=[CH:26][C:25](/[CH:29]=[C:30](\[CH3:36])/[C:31]([O:33][CH2:34][CH3:35])=[O:32])=[CH:24][C:23]=2[F:37])=[CH:19][CH:18]=1)(=[O:16])=[O:15].[CH3:40][N:41]([CH:43]=[O:44])C>>[O:44]=[C:43]([NH:41][CH2:40][CH2:3][O:4][CH2:5][CH2:6][O:7][CH2:8][CH2:9][O:10][CH2:11][CH2:12][NH:13][S:14]([C:17]1[CH:18]=[CH:19][C:20]([O:21][C:22]2[C:23]([F:37])=[CH:24][C:25]([CH:29]=[C:30]([C:31]([O:33][CH2:34][CH3:35])=[O:32])[CH3:36])=[CH:26][C:27]=2[F:28])=[CH:38][CH:39]=1)(=[O:16])=[O:15])[NH:1][CH2:2][CH2:3][O:4][CH2:5][CH2:6][O:7][CH2:8][CH2:9][O:10][CH2:11][CH2:12][NH:13][S:14]([C:17]1[CH:39]=[CH:38][C:20]([O:21][C:22]2[C:23]([F:37])=[CH:24][C:25]([CH:29]=[C:30]([C:31]([O:33][CH2:34][CH3:35])=[O:32])[CH3:36])=[CH:26][C:27]=2[F:28])=[CH:19][CH:18]=1)(=[O:16])=[O:15]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

3

반응물 2

HCID 6228DimethylformamideHCID 70906018(E)-ethyl 3-(4-(4-(N-(2-(2-(2-(2-aminoethoxy)ethoxy)ethoxy)ethyl)sulfamoyl)phenoxy)-3,5-difluorophenyl)-2-methylacrylate2회

생성물 1

HCID 86672340N,N'-(13-oxo-3,6,9,17,20,23-hexaoxa-12,14-diazapentacosane-1,25-diyl)bis[4-(2,6-difluoro-4-(2-carboethoxypropenyl)phenoxy)benzenesulfonamide]

실험 절차

Carbonyldiimidisole (16.2 mg, 0.10 mmol) was added to a solution of (E)-ethyl 3-(4-(4-(N-(2-(2-(2-(2-aminoethoxy)ethoxy)ethoxy)ethyl)sulfamoyl)phenoxy)-3,5-difluorophenyl)-2-methylacrylate (intermediate 44.2) (125 mg, 0.22 mmol) in DMF (2 mL) and stirred for 23 hours at which time the solvent was removed under vacuum. The residue was dissolved in EtOAc, washed with water (4×10 mL), dried (Na2SO4) and concentrated to give the title compound (132 mg).

후처리

  1. customwas removed under vacuum
  2. dissolutionThe residue was dissolved in EtOAc
  3. washwashed with water (4×10 mL)
  4. dry with materialdried (Na2SO4)
  5. concentrationconcentrated

출처 및 근거

ORD 기록
ord-bb4880ed6cb64137afb7bd51b851a7b8
출처 데이터셋
uspto-grants-2015_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09006281B2

반응 노트

불러오는 중…

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트