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Trifluoroacetic acid → HCID 178419938, 화합물

HRID 1471013
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인쇄 미리보기

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HRID 1471013 반응식
O=[C:2]([C:30]1[CH:35]=[CH:34][C:33]([C:36]2[NH:40][C:39]([C@@H:41]3[CH2:45][CH2:44][CH2:43][N:42]3C(OC(C)(C)C)=O)=[N:38][CH:37]=2)=[CH:32][CH:31]=1)[CH2:3][CH2:4][C:5]([C:7]1[CH:12]=[CH:11][C:10]([C:13]2[NH:17][C:16]([C@@H:18]3[CH2:22][CH2:21][CH2:20][N:19]3C(OC(C)(C)C)=O)=[N:15][CH:14]=2)=[CH:9][CH:8]=1)=O.Cl.Cl.[N:55]1([C:61]2[N:66]=[CH:65][C:64]([NH2:67])=[CH:63][CH:62]=2)[CH2:60][CH2:59][CH2:58][CH2:57][CH2:56]1.C(O)(C(F)(F)F)=O>C1(C)C=CC=CC=1>[NH:19]1[CH2:20][CH2:21][CH2:22][C@H:18]1[C:16]1[NH:15][CH:14]=[C:13]([C:10]2[CH:9]=[CH:8][C:7]([C:5]3[N:67]([C:64]4[CH:63]=[CH:62][C:61]([N:55]5[CH2:56][CH2:57][CH2:58][CH2:59][CH2:60]5)=[N:66][CH:65]=4)[C:2]([C:30]4[CH:35]=[CH:34][C:33]([C:36]5[N:40]=[C:39]([C@@H:41]6[CH2:45][CH2:44][CH2:43][NH:42]6)[NH:38][CH:37]=5)=[CH:32][CH:31]=4)=[CH:3][CH:4]=3)=[CH:12][CH:11]=2)[N:17]=1
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 6422Trifluoroacetic acid2회HCID 457923666-(Piperidin-1-yl)pyridin-3-amine dihydrochlorideHCID 59616670di-tert-butyl (2S,2'S)-2,2'-[(1,4-dioxobutane-1,4-diyl)bis(benzene-4,1-diyl-1H-imidazole-5,2-diyl)]dipyrrolidine-1-carboxylate

생성물 1

HCID 178419938HCID 178419938, 화합물수율 170.4%

시약·촉매·용매 1

HCID 1140
Toluene
용매

반응 조건

온도
110 °C

실험 절차

To a solution of the product from Example 138B (0.20 g, 0.28 mmol) and the product from Example 144C (0.11 g, 0.42 mmol) in toluene (2.8 mL) was added TFA (22 μL, 0.28 mmol). The mixture was stirred at 110° C. for 3 hours. To the cooled mixture was added TFA (0.5 mL) and the mixture was stirred for 1 h at rt. The solvent was then removed under reduced pressure and triturated with diethylether and dried to provide 0.31 g of the desired compound as a TFA salt. 1HNMR (DMSO-d6; 400 MHz): δ 9.78 (br s, 2H), 7.84 (d, J=2.71 Hz, 1H), 7.75 (s, 2H), 7.67 (AA′XX′, J=8.34 Hz, 4H), 7.35 (dd, J=9.11, 2.71 Hz, 1H), 7.18 (AA′XX′, J=8.46 Hz, 4H), 6.79 (d, J=9.11 Hz, 1H), 6.53 (s, 2H), 4.79 (app t, J=7.81 Hz, 2H), 3.4-3.2 (m, 4H), 2.44-2.36 (m, 2H), 2.25-1.98 (m, 6H), 1.65-1.45 (m, 6H).

후처리

  1. stirringthe mixture was stirred for 1 h at rt
  2. customThe solvent was then removed under reduced pressure
  3. customtriturated with diethylether
  4. customdried

출처 및 근거

ORD 기록
ord-dd5636cd49d342dd9833fac273215764
출처 데이터셋
uspto-grants-2015_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09006387B2

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