HCID 86683594, 화합물 → HCID 53262183, 화합물

HRID 1509182노트

반응식

HRID 1509182 반응식
[CH3:1][C:2]1[N:6]2[C:7]3[CH:14]=[C:13]([C:15]4[CH:20]=[CH:19][CH:18]=[CH:17][CH:16]=4)[C:12]([C:21]4[CH:26]=[CH:25][C:24]([C:27]5([NH:31]C(=O)OC(C)(C)C)[CH2:30][CH2:29][CH2:28]5)=[CH:23][CH:22]=4)=[N:11][C:8]=3[O:9][CH2:10][C:5]2=[N:4][N:3]=1>C(O)(C(F)(F)F)=O>[CH3:1][C:2]1[N:6]2[C:7]3[CH:14]=[C:13]([C:15]4[CH:16]=[CH:17][CH:18]=[CH:19][CH:20]=4)[C:12]([C:21]4[CH:22]=[CH:23][C:24]([C:27]5([NH2:31])[CH2:30][CH2:29][CH2:28]5)=[CH:25][CH:26]=4)=[N:11][C:8]=3[O:9][CH2:10][C:5]2=[N:4][N:3]=1

참가 물질

3

반응물 1

HCID 86683594HCID 86683594, 화합물

생성물 1

HCID 53262183HCID 53262183, 화합물수율 55.5%

시약·촉매·용매 1

HCID 6422Trifluoroacetic acid용매

실험 절차

Tert-butyl (1-(4-(1-methyl-8-phenyl-4H-pyrido[2,3-b][1,2,4]triazolo[4,3-d][1,4]oxazin-7-yl)phenyl)cyclobutyl)carbamate (11 mg, 0.022 mmol) was dissolved in TFA (1 ml) and stirred for 30 seconds. The solution was immediately concentrated to dryness under reduced pressure. The residue was dissolved in diethyl ether (˜2 ml) and concentrated to dryness under reduced pressure. This was repeated three times. The residue was then slurred in diethyl ether (2 ml) and after settling the supernatant solvent removed by pipette. This was repeated three times. The residue was then slurred in n-hexanes (2 ml) and after settling the supernatant solvent removed by pipette. This was repeated three times. The remaining solvent was removed under reduced pressure and the residue was dried to give the desired product as an off-white solid (5 mg, 55% yield). LCMS (Method A): RT=3.71 min, M+1=411. 1H-NMR (500 MHz, CD3OD) δ 8.11 (1H, s), 7.49-7.44 (2H, d), 7.42-7.37 (2H, d), 7.35-7.30 (3H, m), 7.29-7.25 (2H, m), 5.63 (2H, s), 2.84 (3H, s), 2.80-2.70 (2H, m), 2.61-2.51 (2H, m), 2.28-2.17 (1H, m), 2.01-1.88 (1H, m).

후처리

  1. concentrationThe solution was immediately concentrated to dryness under reduced pressure
  2. dissolutionThe residue was dissolved in diethyl ether (˜2 ml)
  3. concentrationconcentrated to dryness under reduced pressure
  4. customremoved by pipette
  5. customremoved by pipette
  6. customThe remaining solvent was removed under reduced pressure
  7. customthe residue was dried

출처 및 근거

ORD 기록
ord-c60ec423afa4481d88e4df140ffd5dde
출처 데이터셋
uspto-grants-2015_12
특허 번호
US09221838B2

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