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N-Butyl-N-nitrosobutyramide → Jeffamine

HRID 1587241
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인쇄 미리보기

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HRID 1587241 반응식
[CH3:1][CH2:2][CH2:3][CH2:4][N:5]([N:11]=[O:12])[C:6]([CH2:8][CH2:9][CH3:10])=[O:7].[CH3:13][CH:14]([NH2:29])[CH2:15][O:16][CH2:17][CH:18]([O:20][CH2:21][CH:22]([O:24][CH2:25][CH:26]([NH2:28])[CH3:27])[CH3:23])[CH3:19].C(Cl)(Cl)Cl.CO.O.C(O)(=O)C>>[CH3:13][CH:14]([NH2:29])[CH2:15][O:16][CH2:17][CH:18]([O:20][CH2:21][CH:22]([O:24][CH2:25][CH:26]([NH2:28])[CH3:27])[CH3:23])[CH3:19].[CH3:1][CH2:2][CH2:3][CH2:4][N:5]([N:11]=[O:12])[C:6]([CH2:8][CH2:9][CH3:10])=[O:7].[CH3:13][CH:14]([NH2:29])[CH2:15][O:16][CH2:17][CH:18]([O:20][CH2:21][CH:22]([O:24][CH2:25][CH:26]([NH2:28])[CH3:27])[CH3:23])[CH3:19]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 149617N-Butyl-N-nitrosobutyramideHCID 15131492JeffamineHCID 21923999Chloroform methanol acetic acid water

생성물 2

HCID 15131492JeffamineHCID 131716719nBBA Jeffamine

실험 절차

Polyoxypropylenepolyamines and polyoxethylenepolyamines (referred to as "Jeffamines", a trademark of Jefferson Chemical Co., Inc.) were photolabeled by coupling the N-oxysuccinimide ("NOS") esters of ANP-EACA, BBA and nBBA to the polymers. These NOS-derivatives were added in 0.5× amounts to 1× Jeffamine in very dry (high purity) solvents (ANP-EAC-NOS in dry tetrahydrofuran, BBA-NOS in dry dioxane or dimethylformamide and nitro BBA-NOS in dry dioxane or dimethylformamide). After 16 hours of reaction at room temperature in the dark, the products were isolated by TLC in 85/15/1/1/ chloroform/methanol/H2O/acetic acid. Monosubstituted Jeffamine derivatives were extracted with the TLC solvent and azeotrophed with water to remove the residual acetic acid. The water-soluble products ANP-EAC-Jeffamine, BBA-Jeffamine, and nBBA-Jeffamine were isolated in 15%, 10% and 12% yields, respectively.

후처리

  1. dry with materialin very dry (high purity) solvents (ANP-EAC-NOS in dry tetrahydrofuran, BBA-NOS in dry dioxane
  2. customAfter 16 hours of reaction at room temperature in the dark
  3. extractionMonosubstituted Jeffamine derivatives were extracted with the TLC solvent
  4. customto remove the residual acetic acid

출처 및 근거

ORD 기록
ord-af8cb54d1553476eabc046365fcd7c89
출처 데이터셋
uspto-grants-1993_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05217492

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