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N,N,N',N'-Tetramethylethylenediamine → 1,4-Dimethoxy-2,5-bis(methoxymethoxy)-3-methylthiobenzene

HRID 1588136
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HRID 1588136 반응식
[CH3:1][O:2][C:3]1[CH:8]=[C:7]([O:9][CH2:10][O:11][CH3:12])[C:6]([O:13][CH3:14])=[CH:5][C:4]=1[O:15][CH2:16][O:17][CH3:18].CN(C)CCN(C)C.C([Li])CCC.[CH3:32][S:33]SC>C1(C)C=CC=CC=1.CN(C)P(=O)(N(C)C)N(C)C.C(OCC)C>[CH3:14][O:13][C:6]1[CH:5]=[C:4]([O:15][CH2:16][O:17][CH3:18])[C:3]([O:2][CH3:1])=[C:8]([S:33][CH3:32])[C:7]=1[O:9][CH2:10][O:11][CH3:12]
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참가 물질

8

반응물 4

HCID 8037N,N,N',N'-TetramethylethylenediamineHCID 12232Dimethyl DisulfideHCID 10061046HCID 10061046, 화합물HCID 178418339Butyllithium

생성물 1

HCID 197571571,4-Dimethoxy-2,5-bis(methoxymethoxy)-3-methylthiobenzene

시약·촉매·용매 3

HCID 1140Toluene용매
HCID 3283
Diethyl Ether
용매
HCID 12679Hexamethylphosphoramide용매

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온도
-78 °C

실험 절차

259 Milligrams of 1,4-dimethoxy-2,5-bis(methoxymethoxy)benzene was dissolved in a mixed solvent of 12 ml of toluene with 3 ml of hexamethylphosphoric triamide, to this solution was added 0.303 ml of N,N,N',N'-tetramethylethylenediamine, then the whole mixture was cooled to -78° C. in a dry ice-acetone bath. Next, 1.34 ml of n-butyllithium (1.6 mole hexane solution ) was added dropwise to the reaction mixture and stirred for 20 minutes. Further, 0.14 ml of dimethyl disulfide was added dropwise and stirred for additional 2 hours. The reaction mixture was warmed to room temperature, 30 ml of diethyl ether was added, then the organic layer was washed three times with 20 ml of water, further washed three times with 20 ml of a saturated sodium chloride aqueous solution, and dried over anhydrous magnesium sulfate. Then this solution was concentrated under reduced pressure, and the residue obtained was purified by thin layer chromatography (thickness 2 mm, silica gel, solvent: 40% ethyl acetate-n-hexane solution) to yield 152 mg of 1,4-dimethoxy-2,5-bis(methoxymethoxy)-3-methylthiobenzene. Colorless oily substance.

후처리

  1. stirringstirred for additional 2 hours
  2. temperatureThe reaction mixture was warmed to room temperature
  3. washthe organic layer was washed three times with 20 ml of water
  4. washfurther washed three times with 20 ml of a saturated sodium chloride aqueous solution
  5. dry with materialdried over anhydrous magnesium sulfate
  6. concentrationThen this solution was concentrated under reduced pressure
  7. customthe residue obtained
  8. customwas purified by thin layer chromatography (thickness 2 mm, silica gel, solvent

출처 및 근거

ORD 기록
ord-1987342c1de84e2fba9ef948230dd3e1
출처 데이터셋
uspto-grants-1993_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05220042

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