Triethylamine → Nonamethyltetrasiloxanyl 2-methylprop-2-enoate

HRID 16035

반응식

HRID 16035 반응식
[CH3:1][Si:2]1([CH3:12])[O:7][Si:6]([CH3:9])([CH3:8])[O:5][Si:4]([CH3:11])([CH3:10])[O:3]1.[C:13]([O:18][Si:19](C)([CH3:21])[CH3:20])(=[O:17])[C:14]([CH3:16])=[CH2:15].[CH3:23]OC1C=CC(O)=CC=1.C(N(CC)CC)C>C1(C)C=CC=CC=1.[Cl-].[Zn+2].[Cl-]>[CH3:23][Si:2]([CH3:12])([CH3:1])[O:3][Si:4]([CH3:11])([CH3:10])[O:5][Si:6]([CH3:9])([CH3:8])[O:7][Si:19]([CH3:21])([CH3:20])[O:18][C:13](=[O:17])[C:14]([CH3:16])=[CH2:15]

참가 물질

7

반응물 4

HCID 8471TriethylamineHCID 90154-MethoxyphenolHCID 10914HexamethylcyclotrisiloxaneHCID 27338392-Propenoic acid, 2-methyl-, trimethylsilyl ester

생성물 1

HCID 12991985Nonamethyltetrasiloxanyl 2-methylprop-2-enoate

시약·촉매·용매 2

HCID 3007855Zincchloride촉매HCID 1140Toluene용매

실험 절차

50 g of hexamethylcyclotrisiloxane, 35.6 g of trimethylsilyl methacrylate, 2.5 g of zinc chloride and 0.4 g of 4-methoxy phenol were dissolved in 50 ml of toluene. After 11 h at 100° C., the mixture was allowed to cool until room temperature, 40 ml of triethylamine were then added and the salts were filtered. After evaporation of the solvent, distillation under reduced pressure (0.3 mbar, 80° C.) furnished pure nonamethyl-1-methacryloyloxy-tetrasiloxane.

후처리

  1. filtrationthe salts were filtered
  2. customAfter evaporation of the solvent, distillation under reduced pressure (0.3 mbar, 80° C.)

출처 및 근거

ORD 기록
ord-940987a91602489c8ac2c7785e3142dd
출처 데이터셋
uspto-grants-2010_06
특허 번호
US07736634B2

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