Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
Naphthalene → 1,8-Dinitronaphthalene
참여 물질
| 역할 | 이름 | HCID | 투입량 |
|---|---|---|---|
| 반응물 | Naphthalene | HCID 931 | — |
| 반응물 | Nitric Acid | HCID 944 | — |
| 반응물 | 1-Nitronaphthalene | HCID 6849 | — |
| 반응물 | 1,5-Dinitronaphthalene | HCID 11803 | — |
| 생성물 | 1,8-Dinitronaphthalene | HCID 11764 | — |
반응 단계
The process for the production of 1,5-dinitronaphthalene according to the invention is based on the direct nitration of naphthalene by nitric acid having a concentration of 72–87 wt.-% without mononitronaphthalene isolation. The washing of the reaction products with water and acetone leads to 1,5-dinitronaphthalene of high purity [≧98 wt.-%]. The acetone and nitric acid used in the process may be recovered and returned into the process. 1,8-dinitronaphthalene is produced in the process as a by-product.
출처 및 근거
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| 특허 번호 | US06992230B2 |
| 출처 데이터셋 | uspto-grants-2006_01 |
| ORD ID | ord-f34cb4e0405e4cfa9fba5729bb1e81cc |
| 출처 메모 | uspto-grants-2006_01 |