반응식
[O-2:1].[In+3:2].[O-2].[O-2].[In+3].[O-2].[Sm+3:7].[O-2].[O-2].[Sm+3]>>[O-2:1].[In+3:2].[O-2:1].[O-2:1].[In+3:2].[O-2:1].[Sm+3:7].[O-2:1].[O-2:1].[Sm+3:7]참가 물질
3
실험 절차
Except that a spattering target containing indium oxide and samarium oxide (molar ratio of In:Sm=90:10) was used, indium oxide-samarium oxide (ISmO) thin films were formed in the same manner as in Example 1-1 and Comparative 1-1. [Evaluation of ISmO thin films of Example 1-9 and Comparative 1-9]
출처 및 근거
- ORD 기록
- ord-4992c4eca05c4639a7000ff222199b8e
- 출처 데이터셋
- uspto-grants-2014_07
- 특허 번호
- US08785920B2
연결된 노트
불러오는 중…