Cesium fluoride → HCID 66906521, 화합물

HRID 1690632노트

반응식

HRID 1690632 반응식
[CH3:1][O:2][CH2:3][CH2:4][CH2:5][O:6][C:7]1[CH:8]=[C:9]([CH2:21][CH2:22][C:23]([O:25][CH2:26][CH3:27])=[O:24])[CH:10]=[CH:11][C:12]=1OS(C(F)(F)F)(=O)=O.[N:28]1([C:34]([C:36]2[CH:41]=[CH:40][C:39](B(O)O)=[CH:38][CH:37]=2)=[O:35])[CH2:33][CH2:32][O:31][CH2:30][CH2:29]1.[F-].[Cs+]>C(COC)OC.C(O)C>[CH3:1][O:2][CH2:3][CH2:4][CH2:5][O:6][C:7]1[CH:8]=[C:9]([CH2:21][CH2:22][C:23]([O:25][CH2:26][CH3:27])=[O:24])[CH:10]=[CH:11][C:12]=1[C:39]1[CH:38]=[CH:37][C:36]([C:34]([N:28]2[CH2:33][CH2:32][O:31][CH2:30][CH2:29]2)=[O:35])=[CH:41][CH:40]=1

참가 물질

6

반응물 3

HCID 25953Cesium fluorideHCID 2773546[4-(Morpholine-4-carbonyl)phenyl]boronic acidHCID 86633298Ethyl 3-[3-(3-methoxypropoxy)-4-{[(trifluoromethyl)sulfonyl]oxy}phenyl]propanoate

생성물 1

HCID 66906521HCID 66906521, 화합물수율 65.9%

시약·촉매·용매 2

HCID 702Ethanol용매HCID 80711,2-Dimethoxyethane용매

실험 절차

Ethyl 3-[3-(3-methoxypropoxy)-4-{[(trifluoromethyl)sulfonyl]oxy}phenyl]propanoate (0.8 g, 1.9 mmol) was dissolved in dimethoxyethane (12 mL) and ethanol (1.2 mL). 4-Morpholine-4-carbonylphenylboronic acid (0.50 g, 2.1 mmol) was added and argon: was bubbled in the mixture for 15 minutes. Cesium fluoride (0.6 g, 4.2 mmol) and tetrakistriphenylphosphine palladium (0.11 g, 0.1 mmol) were added and the mixture was brought to reflux under an argon atmosphere for 4 hours. After cooling to room temperature, solvents were evaporated under reduced pressure and the residue was dissolved in ethyl acetate/water (15 mL/15 mL). The organic layer was washed with saturated aqueous sodium bicarbonate and brine, dried over anhydrous sodium sulfate, filtered and evaporated under reduced pressure. The residue was purified by flash chromatography on silica gel (cyclohexane/ethyl acetate, 7/3) to yield 0.57 g (65%) of the desired product as a yellow oil.

후처리

  1. customargon: was bubbled in the mixture for 15 minutes
  2. temperatureto reflux under an argon atmosphere for 4 hours
  3. customsolvents were evaporated under reduced pressure
  4. dissolutionthe residue was dissolved in ethyl acetate/water (15 mL/15 mL)
  5. washThe organic layer was washed with saturated aqueous sodium bicarbonate and brine
  6. dry with materialdried over anhydrous sodium sulfate
  7. filtrationfiltered
  8. customevaporated under reduced pressure
  9. customThe residue was purified by flash chromatography on silica gel (cyclohexane/ethyl acetate, 7/3)

출처 및 근거

ORD 기록
ord-a0c42781e561466e8a42a55890a1c7f9
출처 데이터셋
uspto-grants-2012_04
특허 번호
US08153647B2

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