홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

N-methyl-2-pyrrolidone → HCID 178448078, 화합물

HRID 1707530
노트
인쇄 미리보기

반응식

HRID 1707530 반응식
Br[C:2]1[C:7]([F:8])=[CH:6][C:5]([CH:9]2[O:14][CH2:13][CH:12]([CH:15]3[CH2:20][CH2:19][CH:18]([CH2:21][CH2:22][CH3:23])[CH2:17][CH2:16]3)[CH2:11][O:10]2)=[CH:4][C:3]=1[F:24].[CH3:25][N:26]1C(=O)CCC1>>[C:25]([C:2]1[C:7]([F:8])=[CH:6][C:5]([C@H:9]2[O:14][CH2:13][C@H:12]([C@H:15]3[CH2:20][CH2:19][C@H:18]([CH2:21][CH2:22][CH3:23])[CH2:17][CH2:16]3)[CH2:11][O:10]2)=[CH:4][C:3]=1[F:24])#[N:26]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

3

반응물 2

HCID 13387N-methyl-2-pyrrolidoneHCID 189615332-(4'-Bromo-3',5'-difluorophenyl)-5-(4'-propylcyclohexyl)-1,3-dioxane

생성물 1

HCID 178448078HCID 178448078, 화합물

실험 절차

7.3 g (0.018 mol) of 2-(4'-bromo-3',5'-difluorophenyl)-5-(4'-propylcyclohexyl)-1,3-dioxane, 2.5 g (0.027 mol) of CuCN2 and 54 cm3 of NMP were refluxed for 2 hours with a mantle heater. After cooling the reactant to room temperature, 40 cm3 of EDA was added, it was poured into 50 cm3 of ice water, extracted with chloroform and washed with an aqueous EDA solution and water. The chloroform was removed, and the residue was dissolved in hexane and washed with water to remove the NMP. The hexane was removed, and the residue was treated in a silica gel column with chloroform as the solvent. The chloroform was removed, and the residue was repeatedly recrystallized in a solvent mixture of acetone and methanol until there were no cis forms to obtain 1.4 g (0.004 mol) of trans-2-(4'-cyano-3',5'-difluorophenyl)-5-(trans-4'-propylcyclohexyl)-1,3-dioxane. The phase transition temperature of this compound was measured with DSC as follows. ##STR17## (here, C shows crystals, N shows the nematic phase and I shows isotropic liquid.)

후처리

  1. addition40 cm3 of EDA was added
  2. extractionextracted with chloroform
  3. washwashed with an aqueous EDA solution and water
  4. customThe chloroform was removed
  5. dissolutionthe residue was dissolved in hexane
  6. washwashed with water
  7. customto remove the NMP
  8. customThe hexane was removed
  9. additionthe residue was treated in a silica gel column with chloroform as the solvent
  10. customThe chloroform was removed
  11. customthe residue was repeatedly recrystallized in a solvent mixture of acetone and methanol until there

출처 및 근거

ORD 기록
ord-40893ff6e4ea4a2b95a175bd828872bc
출처 데이터셋
uspto-grants-1994_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05354502

반응 노트

불러오는 중…

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트