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2,4-Dimethylphenol → HCID 18961265, 화합물

HRID 1708259
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HRID 1708259 반응식
[CH3:1][C:2]1[CH:7]=[C:6]([CH3:8])[CH:5]=[CH:4][C:3]=1[OH:9].[C:10]([CH2:13][O:14][C:15]1[CH:25]=[CH:24][C:18]([CH:19](O)[C:20]([OH:22])=O)=[CH:17][CH:16]=1)([OH:12])=[O:11].[CH2:26](O)[CH2:27][CH2:28][CH2:29][CH2:30][CH2:31][CH2:32][CH2:33][CH2:34][CH2:35][CH2:36][CH2:37][CH2:38][CH2:39][CH2:40][CH2:41][CH2:42][CH3:43]>C1(C)C=CC=CC=1.C1(C)C=CC(S(O)(=O)=O)=CC=1>[CH3:8][C:6]1[CH:7]=[C:2]([CH3:1])[C:3]2[O:9][C:20](=[O:22])[CH:19]([C:18]3[CH:17]=[CH:16][C:15]([O:14][CH2:13][C:10]([O:12][CH2:43][CH2:42][CH2:41][CH2:40][CH2:39][CH2:38][CH2:37][CH2:36][CH2:35][CH2:34][CH2:33][CH2:32][CH2:31][CH2:30][CH2:29][CH2:28][CH2:27][CH3:26])=[O:11])=[CH:25][CH:24]=3)[C:4]=2[CH:5]=1
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 3

HCID 77712,4-DimethylphenolHCID 8221Stearyl AlcoholHCID 109987014-Carboxymethoxymandelic acid

생성물 1

HCID 18961265HCID 18961265, 화합물수율 38.1%

시약·촉매·용매 2

HCID 6101p-Toluenesulfonic acid촉매HCID 1140Toluene용매

반응 조건

온도
185 °C

실험 절차

A mixture of 18.3 g (0.15 mol) of 2,4-dimethylphenol and 11.3 g (0.05 mol) of 4-carboxymethoxymandelic acid is stirred at about 185° C. for 3.5 hours. Excess 2,4-dimethylphenol is then distilled off in a high vacuum. 12.5 g (0.046 mol) of 1-octadecanol and 0.3 g (1.58 mmol) of p-toluenesulfonic acid are added to the residue, and the mixture is maintained at about 185° C. under a slight vacuum (50 mbar) for 1.5 hours. The reaction mixture is diluted with 50 ml of toluene and washed with water. The organic phases are combined, dried over magnesium sulfate and concentrated on a vacuum rotary evaporator. Crystallisation of the residue from acetonitrile gives 9.9 g (38%) of 5,7-dimethyl-3-(4-n-octadecyloxycarbonylmethoxyphenyl)benzofuran-2-one, melting point 57°-59° C. (Compound (109), Table 1).

후처리

  1. distillationExcess 2,4-dimethylphenol is then distilled off in a high vacuum
  2. temperaturethe mixture is maintained at about 185° C. under a slight vacuum (50 mbar) for 1.5 hours
  3. washwashed with water
  4. dry with materialdried over magnesium sulfate
  5. concentrationconcentrated on a vacuum rotary evaporator
  6. customCrystallisation of the residue from acetonitrile

출처 및 근거

ORD 기록
ord-0510824d6b8c440a891d4b16a861d195
출처 데이터셋
uspto-grants-1994_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05356966

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