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Triethylamine → HCID 24984414, 화합물

HRID 1710411
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HRID 1710411 반응식
[CH2:1]([N:4]1[CH2:8][C:7]2([CH2:13][CH2:12][CH2:11][CH2:10][CH2:9]2)[O:6][C:5]1=[O:14])[C:2]#[CH:3].I[C:16]1[CH:28]=[CH:27][C:19]([CH2:20][N:21]2[CH2:26][CH2:25][O:24][CH2:23][CH2:22]2)=[CH:18][CH:17]=1.C(N(CC)CC)C>C(#N)C.ClCCl.C1C=CC([P]([Pd]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1.[Cu](I)I>[N:21]1([CH2:20][C:19]2[CH:18]=[CH:17][C:16]([C:3]#[C:2][CH2:1][N:4]3[CH2:8][C:7]4([CH2:9][CH2:10][CH2:11][CH2:12][CH2:13]4)[O:6][C:5]3=[O:14])=[CH:28][CH:27]=2)[CH2:22][CH2:23][O:24][CH2:25][CH2:26]1
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참가 물질

8

반응물 3

HCID 8471TriethylamineHCID 27955004-(4-Iodobenzyl)morpholineHCID 57559825HCID 57559825, 화합물

생성물 1

HCID 24984414HCID 24984414, 화합물수율 41.1%

시약·촉매·용매 4

HCID 83717Copper iodide촉매HCID 178418397
HCID 178418397, 화합물
촉매
HCID 6342Acetonitrile용매
HCID 6344Dichloromethane용매

실험 절차

3-Prop-2-ynyl-1-oxa-3-aza-spiro[4.5]decan-2-one (55 mg, 0.284 mmol), 4-(4-iodo-benzyl)-morpholine (95 mg, 0.313 mmol), tetrakis(triphenylphosphine)palladium (17 mg, 0.0142 mmol), copper iodide (6 mg, 0.0284 mmol) and triethylamine (0.12 mL, 0.853 mmol) were mixed in acetonitrile (1 mL) under argon. The reaction mixture was stirred at room temperature for 1 hour and then diluted with dichloromethane (6 mL). The mixture was washed with water (4 mL), washed with brine (4 mL), dried over sodium sulfate and concentrated. The residue was purified on silica gel eluting with 10 to 25% ethyl acetate in hexanes. The isolated product was treated with 2M hydrochloric acid in diethyl ether to make the hydrochloric acid salt. The salt was then dissolved in water, washed with hexanes and the aqueous phase then made alkaline using aqueous saturated sodium bicarbonate. The aqueous mixture was then extracted with dichloromethane and the organic phase dried over sodium sulfate and concentrated to give the product as an off-white solid (43 mg, 41%). 1H NMR (300 MHz, CDCl3); δ 7.38 (d, 2H), 7.29 (d, 2H), 4.31 (s, 2H), 3.71 (t, 4H), 3.49 (s, 2H), 3.4 (s, 2H), 2.43 (t, 4H), 1.83 (m, 4H), 1.54 (m, 6H).

후처리

  1. washThe mixture was washed with water (4 mL)
  2. washwashed with brine (4 mL)
  3. dry with materialdried over sodium sulfate
  4. concentrationconcentrated
  5. customThe residue was purified on silica gel eluting with 10 to 25% ethyl acetate in hexanes
  6. additionThe isolated product was treated with 2M hydrochloric acid in diethyl ether
  7. dissolutionThe salt was then dissolved in water
  8. washwashed with hexanes
  9. extractionThe aqueous mixture was then extracted with dichloromethane
  10. dry with materialthe organic phase dried over sodium sulfate
  11. concentrationconcentrated

출처 및 근거

ORD 기록
ord-2488d39647494ddbac83d24aa006d8a7
출처 데이터셋
uspto-grants-2010_09
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07790717B2

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