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Aluminium lithium hydride → HCID 68839509, 화합물

HRID 1727262
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HRID 1727262 반응식
C[O:2][C:3](=O)[C:4]1[CH:9]=[CH:8][C:7]([CH2:10][S:11](=[O:20])(=[O:19])[NH:12][C:13]2[CH:14]=[N:15][CH:16]=[CH:17][CH:18]=2)=[CH:6][CH:5]=1.[H-].[H-].[H-].[H-].[Li+].[Al+3]>C1COCC1>[OH:2][CH2:3][C:4]1[CH:9]=[CH:8][C:7]([CH2:10][S:11]([NH:12][C:13]2[CH:14]=[N:15][CH:16]=[CH:17][CH:18]=2)(=[O:20])=[O:19])=[CH:6][CH:5]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 2

HCID 21226445Aluminium lithium hydrideHCID 303913014-(Pyridin-3-ylsulfamoylmethyl)benzoic Acid Methyl Ester

생성물 1

HCID 68839509HCID 68839509, 화합물수율 83%

시약·촉매·용매 1

HCID 8028Tetrahydrofuran용매2회

실험 절차

To a solution of 4-(pyridin-3-ylsulfamoylmethyl)benzoic acid methyl ester (1.91 g, 6.23 mmol) in THF (60 mL) at 0° C. was added a 1 M solution of LiAlH4 in THF (13.7 mL, 13.7 mmol), and the mixture was warmed to room temperature. After stirring for 10 minutes, the mixture was heated to reflux temperature for 3 hours. The reaction mixture was cooled to 0° C. and quenched with saturated Na2SO4 aqueous solution (1.9 mL). The mixture was neutralized with 1 N HCl solution (13.7 mL), and then THF was evaporated under reduced pressure. The residue was diluted with water (70 mL) and extracted with CHCl3 (50 mL×3). The organic layer was washed with brine, dried (Na2SO4) and concentrated under reduced pressure. The residue was purified by MPLC on silica gel (6% MeOH in EtOAc) to afford the titled compound (1.43 g, 83%) as a pale yellow solid.

후처리

  1. temperaturethe mixture was heated
  2. temperatureto reflux temperature for 3 hours
  3. temperatureThe reaction mixture was cooled to 0° C.
  4. customquenched with saturated Na2SO4 aqueous solution (1.9 mL)
  5. customTHF was evaporated under reduced pressure
  6. additionThe residue was diluted with water (70 mL)
  7. extractionextracted with CHCl3 (50 mL×3)
  8. washThe organic layer was washed with brine
  9. dry with materialdried (Na2SO4)
  10. concentrationconcentrated under reduced pressure
  11. customThe residue was purified by MPLC on silica gel (6% MeOH in EtOAc)

출처 및 근거

ORD 기록
ord-b3e1785858934521bf54e2a082e6e3aa
출처 데이터셋
uspto-grants-2009_02
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07495022B2

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