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Formaldehyde → HCID 86708776, 화합물

HRID 1751569
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HRID 1751569 반응식
[CH3:1][CH:2]([CH3:59])[C@H:3]([NH:54][C:55](=[O:58])[O:56][CH3:57])[C:4](=[O:53])[N:5]1[CH2:9][CH2:8][CH2:7][C@H:6]1[C:10]1[NH:11][C:12]([C:15]2[CH:24]=[CH:23][C:22]3[C:17](=[CH:18][CH:19]=[C:20]([C:25]4[CH:30]=[CH:29][C:28]([C:31]5[NH:35][C:34]([C@@H:36]6[CH2:40][CH2:39][CH2:38][N:37]6[C:41]([C@H:43]6[C:52]7[C:47](=[CH:48][CH:49]=[CH:50][CH:51]=7)[CH2:46][CH2:45][NH:44]6)=[O:42])=[N:33][CH:32]=5)=[CH:27][CH:26]=4)[CH:21]=3)[CH:16]=2)=[CH:13][N:14]=1.[CH2:60]=O>[Zn].C(O)(=O)C>[CH3:1][CH:2]([CH3:59])[C@H:3]([NH:54][C:55](=[O:58])[O:56][CH3:57])[C:4]([N:5]1[CH2:9][CH2:8][CH2:7][C@H:6]1[C:10]1[NH:11][C:12]([C:15]2[CH:24]=[CH:23][C:22]3[C:17](=[CH:18][CH:19]=[C:20]([C:25]4[CH:30]=[CH:29][C:28]([C:31]5[NH:35][C:34]([C@@H:36]6[CH2:40][CH2:39][CH2:38][N:37]6[C:41]([C@H:43]6[C:52]7[C:47](=[CH:48][CH:49]=[CH:50][CH:51]=7)[CH2:46][CH2:45][N:44]6[CH3:60])=[O:42])=[N:33][CH:32]=5)=[CH:27][CH:26]=4)[CH:21]=3)[CH:16]=2)=[CH:13][N:14]=1)=[O:53]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 2

HCID 712FormaldehydeHCID 67682387HCID 67682387, 화합물

생성물 1

HCID 86708776HCID 86708776, 화합물

시약·촉매·용매 2

HCID 23994Zinc촉매HCID 176Acetic Acid용매

실험 절차

Methyl (S)-3-methyl-1-oxo-1-((S)-2-(5-(6-(4-(2-((S)-1-((R)-1,2,3,4-tetrahydroisoquinoline-1-carbonyl)pyrrolidin-2-yl)-1H-imidazol-5-yl)phenyl)naphthalen-2-yl)-1H-imidazol-2-yl)pyrrolidin-1-yl)butan-2-ylcarbamate (135 mg, 0.17 mmol), acetic acid (1.7 mL), zinc dust (111 mg, 1.7 mmol), and formaldehyde were all mixed in round bottom flask and stirred at room temperature overnight. The crude mixture was filtered through a celite plug and the filtrate was concentrated down to dryness on rotovap. The residue was then taken up in EtOAc and washed with 10% Na2CO3 and brine and dried over MgSO4. The filtrate was then concentrated down and the residue was purified on reverse phase HPLC. (13 mg, 10%). MS (ESI) m/z 805.77 [M+H]+.

후처리

  1. additionall mixed in round bottom flask
  2. filtrationThe crude mixture was filtered through a celite plug
  3. concentrationthe filtrate was concentrated down to dryness on rotovap
  4. washwashed with 10% Na2CO3 and brine
  5. dry with materialdried over MgSO4
  6. concentrationThe filtrate was then concentrated down
  7. customthe residue was purified on reverse phase HPLC

출처 및 근거

ORD 기록
ord-3b20482203004a329e53df5343f06c93
출처 데이터셋
uspto-grants-2015_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09156823B2

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