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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 1774592생성일: 2026년 10월 26일

Diethyl Ether → Trimethyl-(3-methyl-cyclohex-1-enyloxy)-silane

https://huagongshe.com/reaction/1774592

반응식

참여 물질

역할이름HCID투입량
반응물Diethyl EtherHCID 3283—
반응물ChlorotrimethylsilaneHCID 6397—
반응물N,N,N',N'-TetramethylethylenediamineHCID 8037—
반응물2-Cyclohexen-1-oneHCID 13594—
반응물HCID 178418348HCID 178418348—
촉매Copper iodideHCID 83717—
용매TetrahydrofuranHCID 8028—
생성물Trimethyl-(3-methyl-cyclohex-1-enyloxy)-silaneHCID 59798152%

반응 단계

Under nitrogen atmosphere, a suspension of N,N,N′,N′-tetramethylethylenediamine (0.94 mL, 6.24 mmol) and copper iodide (0.42 g, 2.18 mmol) in anhydrous tetrahydrofuran (4 mL) was stirred at room temperature for 5 minutes. The reaction mixture was cooled to −78° C. and a 1.6 M methyl lithium solution in diethyl ether (1.30 mL, 2.08 mmol) was added. After stirring for 20 minutes at the same temperature, trimethylsilyl chloride (0.66 mL, 5.20 mmol) and a solution of cyclohexenone (0.20 g, 2.08 mmol) in anhydrous tetrahydrofuran (2 mL) were added. The reaction mixture was stirred 20 minutes at −78° C. and quenched with a saturated solution of ammonium chloride (10 mL). Diethyl ether (20 mL) was added and the mixture was allowed to reach room temperature. Layers were separated and the organic layer was successively washed with 0.5N hydrochloric acid (15 mL), and a saturated solution of sodium bicarbonate (15 mL), then dried over sodium sulfate and concentrated in vacuo. The residue was purified by flash chromatography on silica gel (dichloromethane) to provide trimethyl[(3-methylcyclohex-1-en-1-yl)oxy]silane (17a) (0.20 g, 1.08 mmol, 52%).

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US09260395B2
출처 데이터셋uspto-grants-2016_02
ORD IDord-cba562ac7b824b6a9ba2da9c32d61ac0
출처 메모uspto-grants-2016_02