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Triethylamine → HCID 86621214, 화합물

HRID 1855240
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HRID 1855240 반응식
[O:1]1[C:5]2[CH:6]=[CH:7][C:8]([C:10]3([C:13]([OH:15])=O)[CH2:12][CH2:11]3)=[CH:9][C:4]=2[O:3][CH2:2]1.O=S(Cl)Cl.[NH2:20][C:21]1[S:22][C:23]([CH:27]([C:35]2[CH:40]=[CH:39][CH:38]=[CH:37][C:36]=2[Cl:41])[NH:28][S@@:29]([C:31]([CH3:34])([CH3:33])[CH3:32])=[O:30])=[C:24]([CH3:26])[N:25]=1.CCN(CC)CC>CN(C=O)C.C(Cl)Cl>[O:1]1[C:5]2[CH:6]=[CH:7][C:8]([C:10]3([C:13]([NH:20][C:21]4[S:22][C:23]([CH:27]([C:35]5[CH:40]=[CH:39][CH:38]=[CH:37][C:36]=5[Cl:41])[NH:28][S@@:29]([C:31]([CH3:34])([CH3:32])[CH3:33])=[O:30])=[C:24]([CH3:26])[N:25]=4)=[O:15])[CH2:11][CH2:12]3)=[CH:9][C:4]=2[O:3][CH2:2]1
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7

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HCID 8471TriethylamineHCID 24386Thionyl ChlorideHCID 143496081-(1,3-Dioxaindan-5-yl)cyclopropane-1-carboxylic acidHCID 86621215(R)-N-((2-amino-4-methylthiazol-5-yl)(2-chlorophenyl)methyl)-2-methylpropane-2-sulfinamide

생성물 1

HCID 86621214HCID 86621214, 화합물

시약·촉매·용매 2

HCID 6228
Dimethylformamide
촉매
HCID 6344Dichloromethane용매2회

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온도
60 °C

실험 절차

To 1-(benzo[d][1,3]dioxol-5-yl)cyclopropanecarboxylic acid (864 mg, 4.2 mmol) was slowly added SOCl2 (916 μL, 12.6 mmol) followed by DMF (3 drops). The reaction mixture was heated at 60° C. for 0.5 h. The excess SOCl2 was removed under vacuum. The acid chloride was then dissolved in anhydrous CH2Cl2 (6 mL) and was slowly added to a solution of (R)-N-((2-amino-4-methylthiazol-5-yl)(2-chlorophenyl)methyl)-2-methylpropane-2-sulfinamide (Isomer A) (1.35 g, 3.8 mmol) and Et3N (2.92 mL, 21.0 mmol) in anhydrous CH2Cl2 (18 mL). The reaction mixture was stirred at room temperature for 18 h, diluted with CH2Cl2 and washed with 1N HCl solution, saturated aqueous NaHCO3 solution and brine. The organic layer was dried over MgSO4 and concentrated to provide 1-(benzo[d][1,3]dioxol-5-yl)-N-(5-((2-chlorophenyl)((R)-1,1-dimethylethylsulfinamido)methyl)-4-methylthiazol-2-yl)cyclopropanecarboxamide (Isomer A) as an orange solid (1.54 g, 75%) that was used without further purification. HPLC ret. time 3.59 min, 10-99% CH3CN, 5 min run; ESI-MS 546.5 m/z (MH+).

후처리

  1. customThe excess SOCl2 was removed under vacuum
  2. dissolutionThe acid chloride was then dissolved in anhydrous CH2Cl2 (6 mL)
  3. washwashed with 1N HCl solution, saturated aqueous NaHCO3 solution and brine
  4. dry with materialThe organic layer was dried over MgSO4
  5. concentrationconcentrated

출처 및 근거

ORD 기록
ord-7a415fe6d64447fbb37d1cc4e553585c
출처 데이터셋
uspto-grants-2015_02
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08962856B2

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