Acetonitrile → 6-(Pyrrolidinylcarbonyl)-3-[4-(4-methylpiperizin-1-yl)-phenyl]-9H-dipyrido[2,3-b;4',3'-d]pyrrole

HRID 1888549노트

반응식

HRID 1888549 반응식
[N:1]1([C:6]([C:8]2[N:16]=[CH:15][C:14]3[NH:13][C:12]4[N:17]=[CH:18][C:19](Br)=[CH:20][C:11]=4[C:10]=3[CH:9]=2)=[O:7])[CH2:5][CH2:4][CH2:3][CH2:2]1.[C:22](#[N:24])[CH3:23]>C(=O)([O-])[O-].[Na+].[Na+].Cl[Pd](Cl)([P](C1C=CC=CC=1)(C1C=CC=CC=1)C1C=CC=CC=1)[P](C1C=CC=CC=1)(C1C=CC=CC=1)C1C=CC=CC=1>[N:1]1([C:6]([C:8]2[N:16]=[CH:15][C:14]3[NH:13][C:12]4[N:17]=[CH:18][C:19]([C:9]5[CH:10]=[CH:14][C:22]([N:24]6[CH2:4][CH2:5][N:1]([CH3:6])[CH2:2][CH2:3]6)=[CH:23][CH:8]=5)=[CH:20][C:11]=4[C:10]=3[CH:9]=2)=[O:7])[CH2:5][CH2:4][CH2:3][CH2:2]1

참가 물질

5

반응물 2

HCID 6342AcetonitrileHCID 582665346-(Pyrrolidinylcarbonyl)-3-bromo-9H-dipyrido[2,3-b:4',3'-d]pyrrole

생성물 1

HCID 582665466-(Pyrrolidinylcarbonyl)-3-[4-(4-methylpiperizin-1-yl)-phenyl]-9H-dipyrido[2,3-b;4',3'-d]pyrrole수율 5%

시약·촉매·용매 2

HCID 178418476HCID 178418476, 화합물촉매HCID 10340Sodium Carbonate용매

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온도
120 °C

실험 절차

A degassed mixture of 6-(pyrrolidinylcarbonyl)-3-bromo-9H-dipyrido[2,3-b;4′,3′-d]pyrrole (158 mg, 0.457 mmol), 4-(4-methylpiperizin-1-yl)-phenyl-1-boronic acid, pinacol ester (597 mg, 1.98 mmol), and bis(triphenylphosphine)palladium(II) chloride (69.0 mg, 99.0 μmol, 5.0 mol %) in acetonitrile (2.5 mL) and 1.0M aqueous sodium carbonate (2.5 mL)was heated under microwave irradiation at 120° C. for 10 minutes, allowed to cool, and partitioned between ethyl acetate and water. The organic layer was dried over sodium sulfate filtered and concentrated in vacuo. The resultant residue was purified by preparative HPLC (0-30% MeCN/water modified with 0.1% formic acid) to afford an off-white solid (10.0 mg, 5%). 1H NMR (DMSO-D5, 400 MHz) 12.39-12.29 (s, 1H), 9.01 (d, J=2.2 Hz, 1H), 8.88 (d, J=2.2 Hz, 31), 8.86 (s, 1H), 8.70 (s, 1H), 7.69 (d, J=8.7 Hz, 2H), 7.08 (d, J=8.8 Hz, 2H), 3.78 (t, J=6.2 Hz, 2H), 3.57 (t, J=6.2 Hz, 2H), 3.25-3.18 (m, 4H), 2.47 (m, 3H), 2.24 (m, 4H), 1.87 (m, 4H). LCMS (Method D): RT=7.36 min, M+H+=441.

후처리

  1. temperatureto cool
  2. custompartitioned between ethyl acetate and water
  3. dry with materialThe organic layer was dried over sodium sulfate
  4. filtrationfiltered
  5. concentrationconcentrated in vacuo
  6. customThe resultant residue was purified by preparative HPLC (0-30% MeCN/water modified with 0.1% formic acid)

출처 및 근거

ORD 기록
ord-f143c453fedb4f9d808b490c54b2317e
출처 데이터셋
uspto-grants-2013_08
특허 번호
US08501765B2

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