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Trifluoroacetic acid → HCID 59610053, 화합물

HRID 1889184
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반응식

HRID 1889184 반응식
FC(F)(F)C(O)=O.[CH2:8]([O:10][C:11](=[O:40])[C:12]1[CH:17]=[CH:16][C:15]([C:18]2[S:22][C:21]([N:23](C(OC(C)(C)C)=O)CC3C=CC(OC)=CC=3)=[N:20][CH:19]=2)=[CH:14][CH:13]=1)[CH3:9]>>[CH2:8]([O:10][C:11](=[O:40])[C:12]1[CH:13]=[CH:14][C:15]([C:18]2[S:22][C:21]([NH2:23])=[N:20][CH:19]=2)=[CH:16][CH:17]=1)[CH3:9]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

3

반응물 2

HCID 6422Trifluoroacetic acidHCID 59610043HCID 59610043, 화합물

생성물 1

HCID 59610053HCID 59610053, 화합물

실험 절차

Trifluoroacetic acid (5 ml) was added to 4-{2-[tert-Butoxycarbonyl-(4-methoxy-benzyl)-amino]-thiazol-5-yl}-benzoic acid ethyl ester (300 mg, 0.64 mmol) at room temperature and reaction mixture was refluxed for 5 hrs. Trifluoroacetic acid was removed on rotavapour. The residue was taken in water (10 ml) and ethyl acetate (15 ml) and basified this with sodium bicarbonate, layers were separated, and aq. layer was re-extracted with ethyl acetate (15 ml). The combined organic layer was washed with brine (15 ml) and dried over anhydrous sodium sulfate. Solvent was evaporated on rotavapour to get the solid product. The crude material was used for the next step with out any further purification,(150 mg).

후처리

  1. customreaction mixture
  2. temperaturewas refluxed for 5 hrs
  3. customTrifluoroacetic acid was removed on rotavapour
  • customwere separated
  • extractionaq. layer was re-extracted with ethyl acetate (15 ml)
  • washThe combined organic layer was washed with brine (15 ml)
  • dry with materialdried over anhydrous sodium sulfate
  • customSolvent was evaporated on rotavapour
  • customto get the solid product
  • customThe crude material was used for the next step with out any further purification,(150 mg)
  • 출처 및 근거

    ORD 기록
    ord-90de1b3fe7384890a2ecddf97f9df9cc
    출처 데이터셋
    uspto-grants-2013_08
    DOI
    10.6084/m9.figshare.5104873.v1
    특허 번호
    US08501955B2

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