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HCID 58529597, 화합물 → HCID 58529380, 화합물

HRID 1972823
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HRID 1972823 반응식
[NH2:1][C:2]1[C:7]2=[C:8]([C:28]3[CH:29]=[CH:30][C:31]4[C:35]([CH:36]=3)=[N:34][N:33]([CH2:37][C:38]3[CH:43]=[CH:42][CH:41]=[CH:40][CH:39]=3)[CH:32]=4)[CH:9]=[C:10]([CH:11]3[O:16][CH2:15][CH:14]4[CH2:17][N:18](C(OC(C)(C)C)=O)[CH2:19][CH2:20][N:13]4[CH2:12]3)[N:6]2[N:5]=[CH:4][N:3]=1>ClCCl.FC(F)(F)C(O)=O>[CH2:37]([N:33]1[CH:32]=[C:31]2[C:35]([CH:36]=[C:28]([C:8]3[CH:9]=[C:10]([CH:11]4[O:16][CH2:15][CH:14]5[CH2:17][NH:18][CH2:19][CH2:20][N:13]5[CH2:12]4)[N:6]4[C:7]=3[C:2]([NH2:1])=[N:3][CH:4]=[N:5]4)[CH:29]=[CH:30]2)=[N:34]1)[C:38]1[CH:43]=[CH:42][CH:41]=[CH:40][CH:39]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 1

HCID 58529597HCID 58529597, 화합물

생성물 1

HCID 58529380HCID 58529380, 화합물수율 80%

시약·촉매·용매 2

HCID 6344Dichloromethane용매HCID 6422Trifluoroacetic acid용매

실험 절차

To a stirred solution of tert-butyl 3-[4-amino-5-(2-benzyl-2H-indazol-6-yl)pyrrolo[2,1-f][1,2,4]triazin-7-yl]hexahydropyrazino[2,1-c][1,4]oxazine-8(1H)-carboxylate (75 mg, 0.13 mmol) in dichloromethane (5 mL), trifluoroacetic acid (1 mL) was added. The reaction was allowed to stir for 30 minutes and concentrated. The mixture was partitioned between ethyl acetate (30 mL) and pH 14 saturated aqueous NaCl (10 mL). The layers were separated and the organic phase was washed, dried (Na2SO4), and concentrated to dryness. The residue was triturated with Et2O to obtain 50 mg (80%) of the desired product. 1H-NMR (DMSO-d6) 8.53 (s, 1H), 7.90 (s, 1H), 7.78 (d, 1H), 7.57 (s, 1H), 7.35-7.28 (m, 5H), 7.11 (d, 1H), 6.70 (s, 1H), 5.64 (s, 2H), 5.11 (d, 1 H), 3.71 (dd, 1 H), 3.33-3.26 (m, 1H), 2.91 (d, 1H), 2.74-2.58 (m, 4H), 2.39 (t, 1H), 2.21-2.00 (m, 4H); LC-MS [M+H]+=481, RT=2.00 min.

후처리

  1. concentrationconcentrated
  2. customThe mixture was partitioned between ethyl acetate (30 mL) and pH 14 saturated aqueous NaCl (10 mL)
  3. customThe layers were separated
  4. washthe organic phase was washed
  5. dry with materialdried (Na2SO4)
  6. concentrationconcentrated to dryness
  7. customThe residue was triturated with Et2O

출처 및 근거

ORD 기록
ord-66db6dda0ee8465ab8ccc7d2f5dc4780
출처 데이터셋
uspto-grants-2013_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08431695B2

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