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Water → HCID 58529487, 화합물

HRID 1972830
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HRID 1972830 반응식
[NH2:1][C:2]1[C:7]2=[C:8](Br)[CH:9]=[C:10]([CH:11]3[O:16][CH2:15][CH:14]4[CH2:17][N:18](C(OC(C)(C)C)=O)[CH2:19][CH2:20][N:13]4[CH2:12]3)[N:6]2[N:5]=[CH:4][N:3]=1.[CH2:29]([N:36]1[C:44]([CH3:45])=[C:43]2[C:38]([CH:39]=[C:40](B3OC(C)(C)C(C)(C)O3)[CH:41]=[CH:42]2)=[N:37]1)[C:30]1[CH:35]=[CH:34][CH:33]=[CH:32][CH:31]=1.C([O-])([O-])=O.[K+].[K+].O>O1CCOCC1.CN(C=O)C.C1C=CC([P]([Pd]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1>[CH2:29]([N:36]1[C:44]([CH3:45])=[C:43]2[C:38]([CH:39]=[C:40]([C:8]3[CH:9]=[C:10]([CH:11]4[O:16][CH2:15][CH:14]5[CH2:17][NH:18][CH2:19][CH2:20][N:13]5[CH2:12]4)[N:6]4[C:7]=3[C:2]([NH2:1])=[N:3][CH:4]=[N:5]4)[CH:41]=[CH:42]2)=[N:37]1)[C:30]1[CH:35]=[CH:34][CH:33]=[CH:32][CH:31]=1
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참가 물질

8

반응물 4

HCID 962WaterHCID 11430Potassium CarbonateHCID 58529510HCID 58529510, 화합물HCID 58529596HCID 58529596, 화합물

생성물 1

HCID 58529487HCID 58529487, 화합물수율 42%

시약·촉매·용매 3

HCID 178418397
HCID 178418397, 화합물
촉매
HCID 6228Dimethylformamide용매
HCID 312751,4-Dioxane용매

반응 조건

온도
100 °C

실험 절차

To a stirred solution of tert-butyl 3-(4-amino-5-bromopyrrolo[2,1-f][1,2,4]triazin-7-yl)hexahydropyrazino[2,1-c][1,4]oxazine-8(1H)-carboxylate (300 mg, 0.66 mmol) and tetrakis(triphenylphosphine)palladium(0) (114 mg, 0.099 mmol) in degassed 1,4-dioxane (5 mL) and DMF (5 mL) were added 2-benzyl-3-methyl-6-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)-2H-indazole (345 mg, 0.99 mmol), K2CO3 (274 mg, 1.99 mmol), and H2O (1.0 mL). The reaction was degassed and heated (100° C.) for 17 h and then cooled to rt. The mixture was partitioned between ethyl acetate (250 mL) and saturated aqueous K2CO3 solution (200 mL). The layers were separated and the organic phase was washed, dried (Na2SO4), and concentrated to dryness. The crude residue was dissolved in dichloromethane (20 mL) and treated with trifluoroacetic acid (5 mL). The solution was allowed to stir for 30 minutes and concentrated. The mixture was partitioned between ethyl acetate (75 mL) and H2O (50 mL). The layers were separated and the organic phase was washed with 1N HCl (50 mL). The combined aqueous phase was transferred to a stirring mixture of ethyl acetate and pH 14 brine and allowed to stir for 30 minutes, keeping the pH above 12 with additional NaOH pellets as needed. The layers were partitioned and aqueous layer was extracted 2× with ethyl acetate (75 mL ea.). The combined organic phase was washed with brine, dried (Na2SO4), and concentrated to dryness. The residue was triturated with Et2O to obtain 135 mg (42%) of the desired product. 1H NMR (300 MHz, DMSO-d6) 7.91 (s, 1 H), 7.78 (d, 1 H), 7.52 (s, 1 H), 7.34-7.19 (m, 5 H), 7.21 (dd, 1H), 6.72 (s, 1H), 5.63 (s, 2H), 5.12 (dd, 1H), 3.73 (dd, 1H), 3.30-3.23 (m, 1H), 2.92 (dd, 1H), 2.75-2.64 (m, 4H), 2.61 (s, 3H), 2.41 (t, 1H), 2.25-2.06 (m, 4H); LC-MS [M+H]+=495, RT=2.17 min.

후처리

  1. customThe reaction was degassed
  2. temperaturecooled to rt
  3. customThe mixture was partitioned between ethyl acetate (250 mL) and saturated aqueous K2CO3 solution (200 mL)
  4. customThe layers were separated
  5. washthe organic phase was washed
  6. dry with materialdried (Na2SO4)
  7. concentrationconcentrated to dryness
  8. dissolutionThe crude residue was dissolved in dichloromethane (20 mL)
  9. additiontreated with trifluoroacetic acid (5 mL)
  10. concentrationconcentrated
  11. customThe mixture was partitioned between ethyl acetate (75 mL) and H2O (50 mL)
  12. customThe layers were separated
  13. washthe organic phase was washed with 1N HCl (50 mL)
  14. additionThe combined aqueous phase was transferred to a stirring mixture of ethyl acetate and pH 14 brine
  15. stirringto stir for 30 minutes
  16. customThe layers were partitioned
  17. extractionaqueous layer was extracted 2× with ethyl acetate (75 mL ea.)
  18. washThe combined organic phase was washed with brine
  19. dry with materialdried (Na2SO4)
  20. concentrationconcentrated to dryness
  21. customThe residue was triturated with Et2O

출처 및 근거

ORD 기록
ord-83394e7f3a6440cbb0c775fffee294a6
출처 데이터셋
uspto-grants-2013_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08431695B2

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